Tabletop EUV reflection dual-polarisation ptychography enables high-throughput nanoscale material-mapping and angstrom-scale profilometry

Tabletop EUV reflection dual-polarisation ptychography enables high-throughput nanoscale material-mapping and angstrom-scale profilometry | Research Square window.SnipcartSettings = { analytics: { enabled: false } }; (function() { var accessVector = localStorage.getItem('access_vector') || ''; window.dataLayer = window.dataLayer || []; if (accessVector) { window.dataLayer.push({ user: { profile: { profileInfo: { snid: accessVector } } } }); } })(); (function(w,d,s,l,i){w[l]=w[l]||[];w[l].push({'gtm.start':new Date().getTime(),event:'gtm.js'});var f=d.getElementsByTagName(s)[0],j=d.createElement(s),dl=l!='dataLayer'?'&l='+l:'';j.async=true;j.src='https://www.googletagmanager.com/gtm.js?id='+i+dl;f.parentNode.insertBefore(j,f);})(window,document,'script','dataLayer','GTM-K279D39R'); Browse Preprints In Review Journals COVID-19 Preprints AJE Video Bytes Research Tools Research Promotion AJE Professional Editing AJE Rubriq About Preprint Platform In Review Editorial Policies Our Team Advisory Board Help Center Sign In Submit a Preprint Cite Share Download PDF Article Tabletop EUV reflection dual-polarisation ptychography enables high-throughput nanoscale material-mapping and angstrom-scale profilometry Daniel Penagos Molina, Mahmoud Abdelaal, Wilhelm Eschen, Chang Liu, and 8 more This is a preprint; it has not been peer reviewed by a journal. https://doi.org/ 10.21203/rs.3.rs-9267824/v1 This work is licensed under a CC BY 4.0 License Status: Under Review Version 1 posted You are reading this latest preprint version Abstract Extreme-ultraviolet (EUV) reflection ptychography can deliver nanoscale surface metrology with material-specific contrast, but its practical use has been limited by slow acquisition and the need for multi-angle datasets for reliable material identification. Here, we demonstrate Brewster-range, polarisation-resolved EUV reflection ptychography: a single polarisation achieves sub-100 nm diffractionlimited resolution and ˚A-scale height precision over ∼ 90 μm × 90 μm fields of view, while the two-polarisation response at a single incidence angle, enables material identification through enhanced diattenuation and retardance. Driven by a milliwatt-class tabletop high-harmonic-generation (HHG) source and structured illumination, we reach throughputs up to ∼ 100 Mpx h−1, about two orders of magnitude higher than previous tabletop EUV reflection ptychography and comparable to synchrotron-based implementations. This places EUV reflection ptychography in a synchrotron-like throughput regime on a laboratory platform, making it a practical tool for routine, non-destructive nanoscale material characterisation in systems ranging from two-dimensional materials and metasurfaces to magnetic multilayers and catalytic surfaces, and for future ultrafast pump–probe studies. Physical sciences/Materials science/Techniques and instrumentation/Imaging techniques Physical sciences/Optics and photonics/Lasers, LEDs and light sources/Ultrafast lasers Physical sciences/Nanoscience and technology/Techniques and instrumentation/Characterization and analytical techniques Physical sciences/Optics and photonics/Optical physics/High-harmonic generation Physical sciences/Materials science/Techniques and instrumentation/Microscopy ptychography tabletop polarisation material-mapping Full Text Additional Declarations There is NO Competing Interest. Supplementary Files EUVSupplement.pdf Supplemental document Cite Share Download PDF Status: Under Review Version 1 posted You are reading this latest preprint version Research Square lets you share your work early, gain feedback from the community, and start making changes to your manuscript prior to peer review in a journal. As a division of Research Square Company, we’re committed to making research communication faster, fairer, and more useful. We do this by developing innovative software and high quality services for the global research community. Our growing team is made up of researchers and industry professionals working together to solve the most critical problems facing scientific publishing. Also discoverable on Platform About Our Team In Review Editorial Policies Advisory Board Help Center Resources Author Services Accessibility API Access RSS feed Manage Cookie Preferences © Research Square 2026 | ISSN 2693-5015 (online) Privacy Policy Terms of Service Do Not Sell My Personal Information {"props":{"pageProps":{"initialData":{"identity":"rs-9267824","acceptedTermsAndConditions":true,"allowDirectSubmit":false,"archivedVersions":[],"articleType":"Article","associatedPublications":[],"authors":[{"id":621529391,"identity":"fa286dbe-4773-46e9-a586-1ff697c24e4e","order_by":0,"name":"Daniel Penagos 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