Design and Fabrication of Silicon-Based Triangular Lattice Photonic Crystals Using Electron Beam Lithography and Reactive Ion Etching

Design and Fabrication of Silicon-Based Triangular Lattice Photonic Crystals Using Electron Beam Lithography and Reactive Ion Etching | Research Square window.SnipcartSettings = { analytics: { enabled: false } }; (function() { var accessVector = localStorage.getItem('access_vector') || ''; window.dataLayer = window.dataLayer || []; if (accessVector) { window.dataLayer.push({ user: { profile: { profileInfo: { snid: accessVector } } } }); } })(); (function(w,d,s,l,i){w[l]=w[l]||[];w[l].push({'gtm.start':new Date().getTime(),event:'gtm.js'});var f=d.getElementsByTagName(s)[0],j=d.createElement(s),dl=l!='dataLayer'?'&l='+l:'';j.async=true;j.src='https://www.googletagmanager.com/gtm.js?id='+i+dl;f.parentNode.insertBefore(j,f);})(window,document,'script','dataLayer','GTM-K279D39R'); Browse Preprints In Review Journals COVID-19 Preprints AJE Video Bytes Research Tools Research Promotion AJE Professional Editing AJE Rubriq About Preprint Platform In Review Editorial Policies Our Team Advisory Board Help Center Sign In Submit a Preprint Cite Share Download PDF Research Article Design and Fabrication of Silicon-Based Triangular Lattice Photonic Crystals Using Electron Beam Lithography and Reactive Ion Etching RAJNI BALA This is a preprint; it has not been peer reviewed by a journal. https://doi.org/ 10.21203/rs.3.rs-6902732/v1 This work is licensed under a CC BY 4.0 License Status: Posted Version 1 posted You are reading this latest preprint version Abstract This study presents the theoretical modeling and fabrication of an efficient silicon-based photonic crystal waveguide. The structure consists of a two-dimensional triangular lattice of air holes etched into a silicon substrate, with a lattice constant of 400 nm and rod radius of 160 nm, designed to precisely control light propagation. Various defect configurations—such as point defects, missing lattice elements, and shape-modified holes—are introduced to tailor the photonic bandgap and enable waveguiding functionalities. The fabrication process employs high-resolution electron beam lithography (EBL) followed by capacitive coupled reactive ion etching (RIE). Special attention is given to mitigating the proximity effect and optimizing the electron dose parameters to achieve high pattern fidelity. The results contribute to the scalable fabrication of nanophotonic devices for integrated photonic circuits. Electronic Materials and Devices Materials Chemistry Materials Engineering Silicon photonic crystals Triangular lattice Electron beam lithography (EBL) Reactive ion etching (RIE) Nanofabrication Proximity effect correction. Scanning electron microscopy (FESEM Sigma 300) Photonic bandgap structures Full Text Additional Declarations The authors declare no competing interests. Cite Share Download PDF Status: Posted Version 1 posted You are reading this latest preprint version Research Square lets you share your work early, gain feedback from the community, and start making changes to your manuscript prior to peer review in a journal. As a division of Research Square Company, we’re committed to making research communication faster, fairer, and more useful. We do this by developing innovative software and high quality services for the global research community. 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Also discoverable on Platform About Our Team In Review Editorial Policies Advisory Board Help Center Resources Author Services Accessibility API Access RSS feed Manage Cookie Preferences © Research Square 2026 | ISSN 2693-5015 (online) Privacy Policy Terms of Service Do Not Sell My Personal Information {"props":{"pageProps":{"initialData":{"identity":"rs-6902732","acceptedTermsAndConditions":true,"allowDirectSubmit":true,"archivedVersions":[],"articleType":"Research Article","associatedPublications":[],"authors":[{"id":472309733,"identity":"0d9e80dc-a82a-4030-abd6-6b833f83dd1e","order_by":0,"name":"RAJNI BALA","email":"data:image/png;base64,iVBORw0KGgoAAAANSUhEUgAAAZAAAAAyAQMAAABI0h/eAAAABlBMVEX///8AAABVwtN+AAAACXBIWXMAAA7EAAAOxAGVKw4bAAAA40lEQVRIie2RvQrCMBCAA4V0Ocl6QtFXKAgqKPgq6RKX+AYiglAX8VmcOheKmXyAjoVCBydBEIciXgXXtKNgvkC4wH33QxhzOH4TSWcKjHkpPTDoqiAwzmWjQNdOyBiHsInalck+rYqixkAMD/drvqYJ/ex8sinBRS7DKEbox71kpg0NBkrl9omkwmiLEJpeMtKcFISxXRGFQlkjLAxUI/3qoiB1kVQ85OCVq7iTQl2aXdCosbc6IvDWXYRW/Wc9X4hdVt71YzMQfmasCn2E/EYcP7c9vcFPv5F3a892OByOf+QNZ3E+Iu3OrjwAAAAASUVORK5CYII=","orcid":"https://orcid.org/0000-0002-9744-7233","institution":"Indian Institute of Technology (Indian School of Mines) Dhanbad","correspondingAuthor":true,"prefix":"","firstName":"RAJNI","middleName":"","lastName":"BALA","suffix":""}],"badges":[],"createdAt":"2025-06-16 07:33:58","currentVersionCode":1,"declarations":{"humanSubjects":true,"vertebrateSubjects":false,"conflictsOfInterestStatement":false,"humanSubjectEthicalGuidelines":true,"humanSubjectConsent":true,"humanSubjectClinicalTrial":false,"humanSubjectCaseReport":false,"vertebrateSubjectEthicalGuidelines":false},"doi":"10.21203/rs.3.rs-6902732/v1","doiUrl":"https://doi.org/10.21203/rs.3.rs-6902732/v1","draftVersion":[],"editorialEvents":[],"editorialNote":"","failedWorkflow":false,"files":[{"id":84855675,"identity":"f2b3c34b-ce87-4625-98c5-cace1f6ffe3d","added_by":"auto","created_at":"2025-06-18 06:05:31","extension":"pdf","order_by":1,"title":"","display":"","copyAsset":false,"role":"manuscript-pdf","size":1807247,"visible":true,"origin":"","legend":"","description":"","filename":"10.05.2025TriangularLatticePhotonicCrystalspaper.g.pdf","url":"https://assets-eu.researchsquare.com/files/rs-6902732/v1_covered_b5c229fd-10de-4cd4-8fbe-0230dc45a078.pdf"}],"financialInterests":"The authors declare no competing interests.","formattedTitle":"\u003cp\u003eDesign and Fabrication of Silicon-Based Triangular Lattice Photonic Crystals Using Electron Beam Lithography and Reactive Ion Etching\u003c/p\u003e","fulltext":[],"fulltextSource":"","fullText":"","funders":[],"hasAdminPriorityOnWorkflow":false,"hasManuscriptDocX":false,"hasOptedInToPreprint":true,"hasPassedJournalQc":"","hasAnyPriority":true,"hideJournal":true,"highlight":"","institution":"Indian Institute of Technology Dhanbad","isAcceptedByJournal":false,"isAuthorSuppliedPdf":true,"isDeskRejected":"","isHiddenFromSearch":false,"isInQc":false,"isInWorkflow":false,"isPdf":true,"isPdfUpToDate":true,"isWithdrawnOrRetracted":false,"journal":{"display":true,"email":"[email protected]","identity":"researchsquare","isNatureJournal":false,"hasQc":true,"allowDirectSubmit":true,"externalIdentity":"","sideBox":"","snPcode":"","submissionUrl":"/submission","title":"Research Square","twitterHandle":"researchsquare","acdcEnabled":true,"dfaEnabled":false,"editorialSystem":"","reportingPortfolio":"","inReviewEnabled":false,"inReviewRevisionsEnabled":true},"keywords":"Silicon photonic crystals, Triangular lattice, Electron beam lithography (EBL), Reactive ion etching (RIE), Nanofabrication, Proximity effect correction. 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