Hydrophobic SiOxCy :H Thin Films Deposited by PECVD for Photovoltaic Module Protection

Hydrophobic SiOxCy :H Thin Films Deposited by PECVD for Photovoltaic Module Protection | Research Square window.SnipcartSettings = { analytics: { enabled: false } }; (function() { var accessVector = localStorage.getItem('access_vector') || ''; window.dataLayer = window.dataLayer || []; if (accessVector) { window.dataLayer.push({ user: { profile: { profileInfo: { snid: accessVector } } } }); } })(); (function(w,d,s,l,i){w[l]=w[l]||[];w[l].push({'gtm.start':new Date().getTime(),event:'gtm.js'});var f=d.getElementsByTagName(s)[0],j=d.createElement(s),dl=l!='dataLayer'?'&l='+l:'';j.async=true;j.src='https://www.googletagmanager.com/gtm.js?id='+i+dl;f.parentNode.insertBefore(j,f);})(window,document,'script','dataLayer','GTM-K279D39R'); Browse Preprints In Review Journals COVID-19 Preprints AJE Video Bytes Research Tools Research Promotion AJE Professional Editing AJE Rubriq About Preprint Platform In Review Editorial Policies Our Team Advisory Board Help Center Sign In Submit a Preprint Cite Share Download PDF Research Article Hydrophobic SiO x C y :H Thin Films Deposited by PECVD for Photovoltaic Module Protection Ahmed Kotbi, Pierre Barroy, Michael Lejeune, Ilham Hamdi Alaoui, and 3 more This is a preprint; it has not been peer reviewed by a journal. https://doi.org/ 10.21203/rs.3.rs-6311163/v1 This work is licensed under a CC BY 4.0 License Status: Published Journal Publication published 12 Aug, 2025 Read the published version in Optical and Quantum Electronics → Version 1 posted 7 You are reading this latest preprint version Abstract This study explores the optimization of SiO x C y :H thin films fabricated under varying radio frequency power conditions to achieve enhanced water repeal while preserving photovoltaic (PV) performance. Thin films derived from hexamethyldisiloxane were deposited on glass substrates via plasma-enhanced chemical vapor deposition (PECVD). The sessile drop technique was used to assess the water contact angle. Our findings indicate that SiO x C y :H films deposited at 200 W and 300 W exhibit hydrophilic behavior (θ 90°), optimizing surface wettability for water-repellent applications. Notably, applying the 100 W film to a solar cell resulted in minimal efficiency loss (0.47%) and only a 1% decrease in fill factor, confirming that PV performance remained practically unaltered. These findings highlight the potential of SiO x C y :H thin films fabricated at optimized conditions to provide effective protection against moisture without compromising solar cell functionality. SiOxCy:H PECVD hexamethyldisiloxane contact angle wettability photovoltaic Figures Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7 Figure 8 1. Introduction Hydrophobic coatings have garnered increasing attention due to their broad range of applications. In the case of solar modules, they are key players to prevent water condensation and dust accumulation, that could hinder light absorption and subsequently reduce photovoltaic (PV) conversion efficiency. Applying a hydrophobic coating to PV panels offers an effective solution to minimize wetting and prevent corrosion. The efficiency and longevity of PV panels were reported to be significantly affected by the accumulation on their surface, dust, moisture, and other contaminants [ 1 , 2 ]. To mitigate these issues, hydrophobic coatings have emerged as a promising solution to preserve their performance by reducing losses caused by soiling [ 3 , 4 ]. Various studies explored the impact of hydrophobic coatings on PV modules, demonstrating their effectiveness in improving energy output and minimizing maintenance requirements [ 5 – 7 ]. Their analysis revealed that dirt accumulation, humidity, and temperature fluctuations negatively impact the PV modules performance [ 8 , 9 ]. Particularly, in humid conditions, dust deposition led to the formation of an adhesive mud layer on the solar cells surface, which reduced their electricity generation by up to 70% [ 5 ]. Other studies suggested that applying a self-cleaning and anti-reflective coating to PV modules enhanced their efficiency by approximately 11% compared to uncoated modules [ 5 ]. Several approaches have been explored to enhance the durability and efficiency of protective coatings for solar panels. Superhydrophobic films have shown excellent self-cleaning properties, but their poor long-term stability and complex fabrication limit their large-scale application [ 10 – 12 ]. Additionally, anti-reflective coatings improve light transmission but are often sensitive to environmental conditions and degrade over time [ 13 , 14 ]. Therefore, developing a hybrid solution that combines hydrophobicity, optical transparency, and environmental stability is crucial for optimizing PV panel performance. SiO x C y :H is one of the compounds, extensively used as protective films owing to their ease of fabrication, versatility, and cost-effective precursors. They were successfully fabricated using plasma-enhanced chemical vapor deposition (PECVD) [ 15 – 17 ], which enabled precise control over their physicochemical properties. In those studies, the monomer Hexamethyldisiloxane (HMDSO) was employed as a precursor, which was not possible to polymerize using conventional liquid-phase methods. However, under plasma treatment, it undergoes polymerization through radical rearrangement triggered by its dissociation. When processed in a plasma environment, pure HMDSO enabled the formation of stable hydrophobic surfaces due to its high retention of methyl groups [ 18 – 20 ]. Increasing the oxygen-to-monomer flow ratio in plasma processing was reported to yield a reduction in carbon content [ 21 ]. SiO₂-like films deposited from HMDSO/O₂ plasma polymerization were extensively studied and were widely employed as barrier coatings in food packaging applications [ 22 ], and PECVD is particularly well-suited for organosilicon compounds and it is a scalable technology, making it preferable for large-area applications. These fabricated polymers exhibited valuable properties such as flexibility, adaptability, and cost-effectiveness, making them widely used in fields like photovoltaics, optical filtering, and packaging [ 23 – 25 ]. The ability to tailor their surface and optical properties by adjusting deposition conditions significantly expanded their applicability. One of their most critical applications is the deposition of silicon oxide coatings, which was reported to offer excellent barrier and hydrophobic properties [ 26 , 27 ]. Despite SiOxCy:H films have been extensively studied in packaging and optics, their specific application to PV panels remains underexplored. One of the major challenges lies in optimizing the deposition conditions to achieve high-quality coating that preserves the optical efficiency of PV cells while maximizing their protection against environmental contaminants. In this context, this study focuses on the characteristics of SiO x C y :H thin films deposited via PECVD using HMDSO as a precursor under varying radio frequency (RF) power levels. The objective is to develop an optimized hydrophobic coating that serves as protective barrier against corrosion and dust accumulation on PV modules surfaces, without compromising their optical and energy performances. 2. Materials and Methods SiO x C y :H thin films were synthesized via PECVD using HMDSO (C 6 H 18 OSi 2 ) vapor as a precursor (e.g., Fig. 1 ). During the deposition process, the distance between the electrodes was set to 4.5 cm, the total pressure was kept at 14×10 — ³ Torr, and the HMDSO gas flow rate was controlled at 5 sccm. The SiO x C y :H thin films were deposited out on glass substrates at RF powers 100 W, 200 W and 300 W. Fourier-transform infrared (FTIR) spectra of the SiO x C y :H films were recorded using a Bruker Vector 33 spectrometer. The vibrational properties were analyzed using a Renishaw micro-Raman spectrometer with a 532 nm excitation source. Optical transmittance and reflectance of the SiO x C y :H films were analyzed using a JASCO V-670 UV-Vis-NIR spectrophotometer equipped with a PIN-757 horizontal sampling integrating sphere. Film thicknesses were evaluated using a Quanta 200 scanning electron microscope (SEM). The contact angle was determined by analyzing the shape of the drops from the image of the shadow of a sessile drop using the DSA25E device from the company KRUSS. The I-V measurements were made on a polycrystalline solar cell of dimension (80*60) mm covered and not covered with a thin layer of SiO x C y :H in order to examine the effect of the latter on the PV performances. I-V measurements on the polycrystalline solar cell were made under irradiation power of 40 mW/cm 2 of an Ossila solar simulator (model no. G2009A1). The colorimetric parameters after the added SiO x C y :H coating were calculated by Code software to determine the reflected color according to the standard illuminant D65 of the International Commission on Illumination. 3. Results 3.1. Structural properties The FTIR spectrum of the SiO x C y :H thin film, recorded in the wavenumber range of 400 to 1500 cm — ¹, is presented in Fig. 2 a. To enhance the signal-to-noise ratio and ensure accurate spectral analysis, the absorption spectrum was acquired by averaging 30 successive scans. The analysis revealed well-defined absorption peaks characteristic of the material's molecular structure. Specifically, a pronounced peak observed at 1004 cm — ¹ corresponds to the asymmetric stretching vibrations of Si-O-Si bonds. Additionally, two distinct absorption bands were detected at 797 cm — ¹ and 1255 cm — ¹, which are attributed to the bending vibrations of Si-(CH 3 ) x groups. These spectral features are in agreement with previously reported data in the literature [ 19 , 20 , 22 , 28 – 31 ], further confirming the chemical composition and bonding characteristics of the deposited films. The Raman spectrum of SiO x C y :H films, recorded in the range of 900 to 2000 cm — ¹, is shown in Fig. 2 b. A prominent G peak, associated with the stretching of sp 2 bonds, appears around 1462 cm — ¹. Across various carbon-based materials, similarities in Raman spectra are observed, particularly within the 900 to 2000 cm — ¹ range, where the characteristic G and D peaks are present at approximately 1560 cm — ¹ and 1360 cm — ¹, respectively, under visible light excitation. The G peak corresponds to the stretching vibrations of sp 2 bonds in both rings and chains, while the D peak is attributed to the breathing modes of sp 2 atoms within aromatic rings [ 32 , 33 ]. The position of the G peak can vary significantly, typically ranging between 1455 and 1544 cm — ¹, as it is highly sensitive to the strength of C = C bonds [ 34 ]. Table 1 illustrates a reduction in the intensity-to-full-width-at-half-maximum (FWHM) ratio, decreasing from 42.2 to approximately 11. This decline indicates a lower carbon content and, consequently, a reduction in C = C bonds in the sample prepared at 100 W. This phenomenon can be explained by the incorporation of SiO x clusters, leading to the substitution of carbon atoms with heavier silicon atoms. As a result, the C = C bonds weaken due to interactions between carbon and the more electropositive silicon atoms [ 35 ]. Table 1 SiO x C y :H thin films fabricated at different RF powers extracted from Raman measurements. 300 W 200 W 100 W Centre (cm — ¹) 1462.87 1462.03 1464 FWHM (cm — ¹) 100.08 95.81 87.38 Area (a.u.) 902679.3 772464.9 185436.8 Intensity (a.u.) 4224 3792 966 Intensity/ FWHM (a.u.) 42.20 39.57 11.05 The SEM images of the cross-sections of the films deposited at 100 W, 200 W, and 300 W, presented in Fig. 3 a-c, show a decrease in thickness from approximately 900 nm to around 522 nm. This reduction may be due to the high power, which promotes better arrangement and more orderly condensation on the substrate surface. 3.2. Optical properties The transmission and reflection curves as a function of wavelength are depicted in Fig. 4 a–b. Spectral analysis indicates that the transmittance of the SiO x C y :H film within the visible and near-infrared range gradually increased with wavelength for all samples, varying from approximately 20–90%. In contrast, the reflectance remained relatively low, ranging between 10% and 20% across the entire spectral range under investigation. Notably, the SiO x C y :H layer deposited from HMDSO at a power of 100 W exhibited the highest transmittance and the lowest reflectance among all analyzed samples. These findings suggest that this specific sample has minimal absorption. The absorptance (A), determined using the relation A = 100% − T – R [ 16 ], as illustrated in Fig. 4 b, further supports this conclusion. 3.3. Wettability properties The wettability of each sample with respect to water was assessed by measuring the sessile contact angle, θ, using a drop shape analyzer [ 15 ]. The measurement was performed with a 3 µL water droplet, and the contact angle was recorded immediately after deposition. To ensure reliable results, at least four measurements were taken from different areas of the sample surface. These measurements were used to evaluate the hydrophobicity of the thin films. Figure 5 illustrates the variation in water contact angle on SiO x C y :H-coated surfaces deposited under different RF power levels. The results show a significant decrease in contact angle as the applied RF power increases. Specifically, the contact angle droped from 97° for the sample deposited at 100 W to approximately 58° for the one fabricated at 300 W. In this study, the Young-Dupré model [ 36 ] and the Owens-Wendt model (extended Fowkes approach) [ 37 ] were employed to determine the surface energy of SiO x C y :H based on contact angle measurements. Various methods derived from surface energy theory have been reported in the literature [ 38 – 40 ]. When a liquid droplet is placed on a flat solid surface, the equilibrium at the three-phase interface is described by Young’s equation [ 36 , 41 , 42 ]: $$\:{\gamma\:}_{SV}={\gamma\:}_{SL}+{\gamma\:}_{LV}\text{c}\text{o}\text{s}{\theta\:}$$ 1 where γ SV is surface free energy of a solid, θ contact angle between the liquid-air interface and the surface, γ SL is interfacial tension and γ LV is the surface tension of liquid that can be estimated by the Guggenheim-Katayama model we use the following relationship: $$\:{\gamma\:}_{LV}=\frac{0.117\varDelta\:{H}_{v}}{{V}_{m}^{2/3}}$$ 2 where ΔH v is the enthalpy of vaporization (for water ΔH v = 40.65 kJ/mol at 25°C), V m is the molar volume of water is 1.81×10 —1 m 3 /mol. The calculation gives a theoretical surface tension for water of 69.07 mN/m at 25°C which is close to the experimental value of 72.8 mN/m [ 41 , 43 , 44 ]. In the Young-Dupré equation the solid-liquid interfacial tension is equal to the surface tension of the liquid, so Young equation becomes: γ SV = γ LV (1 + cos θ). The Owens-Wendt model allows for the decomposition of total surface energy into polar and non-polar (dispersive) components. The polar component corresponds to dipole-dipole interactions, including hydrogen bonding, while the dispersive component represents Van der Waals forces. This distinction provides a deeper insight into surface properties [ 45 , 46 ]. For water, the dispersive component is \(\:{\gamma\:}_{LV}^{d}\) = 21.8 mN/m, while the polar component is \(\:{\gamma\:}_{LV}^{p}\) = 51.0 mN/m [ 37 ]. It is important to note that the calculated surface energy depends on the chosen model, even when using the same contact angle data. The surface energy of the solid is given by [ 37 ]: $$\:cos\theta\:=-1+2\:\left(\frac{\sqrt{{\gamma\:}_{SV}^{P}{\gamma\:}_{LV}^{P}}+\sqrt{{\gamma\:}_{SV}^{d}{\gamma\:}_{LV}^{d}}}{{\gamma\:}_{LV}}\right)$$ 3 The polar component of the surface energy is often negligible for a SiO x C y :H layer due to its chemical composition and limited interaction with polar liquids like water. SiO x C y :H is a siloxane-based polymer (Si-O-Si) with methyl groups (CH 3 ). Since methyl groups are nonpolar, they exhibit weak interactions with polar molecules such as water. As a result, Eq. ( 3 ) can be simplified as follows: $$\:{\gamma\:}_{SV}^{d}=\left(\frac{(cos\theta\:+1)\times\:{\gamma\:}_{LV}}{2\sqrt{{\gamma\:}_{LV}^{d}}}\right)$$ 4 Both calculation methods indicate that surface energy increases with higher applied RF power, which correlates with a decrease in the contact angle. Table 2 presents the surface energy values obtained using both approaches as a function of the contact angle. This reduction in contact angle leads to an increase in surface energy. Specifically, as the RF power increases, the surface energy rises from 46.87 mN/m for the film deposited at 100 W to approximately 145.01 mN/m for the film fabricated at 300 W based on the Owens-Wendt model. Similarly, using the Young-Dupré model, the surface energy increases from 63.92 mN/m at 100 W to about 111.3 mN/m at 300 W. The surface energy values obtained for the SiO x C y :H coating align well with those reported in reference [ 29 ]. Table 2 Contact angle and surface energy of SiO x C y :H thin films fabricated at different RF powers 100, 200 and 300 W. Power (W) Contact angle (°) Surface energy (mN/m) using Owen-Wendt model Surface energy (mN/m) using the Young-Dupré method 100 W 97 46.87 63.92 200 W 84 69.55 80.41 300 W 58 145.01 111.3 The increase in surface energy is linked to the organic composition of the deposited thin films. The reduction in water contact angle, from 97° for the film deposited at 100 W to approximately 58° for the film deposited at 300 W, reflects a decrease in the hydrophobicity of the material. The presence of organic functional groups such as Si-CH 3 within the film structure contributes to its hydrophobic behavior. This finding suggests that SiO x C y :H enhances the hydrophobic properties of films synthesized at lower RF power levels. Figure 6 presents the variation of the contact angle over time for the three fabricated films. The stability of the water contact angle at approximately 95° for the film deposited at 100 W (see Fig. 6 a) can be attributed to the stabilization of the film's chemical structure. FTIR analysis indicates that increasing the RF power enhances monomer fragmentation in the plasma phase, leading to a decrease in Si–CH 3 bonds while promoting the formation of Si–O–Si bonds. These results align with those reported in reference [ 28 ]. In contrast, at lower RF power levels, the deposited coatings exhibit a greater degree of precursor linearization, characterized by the development of Si–O–Si chains and a higher retention of Si–CH 3 bonds. The film’s structure and composition play a crucial role in determining its hydrophobic properties. Specifically, films synthesized at lower power levels, which contain a higher concentration of Si–CH 3 bonds, exhibit stronger hydrophobic behavior. A layer of SiO x C y :H was deposited on a polycrystalline solar cell to protect it from corrosion and dust accumulation caused by water droplets remaining on the surface after rainfall. This study aims to assess the impact of this coating on photovoltaic (PV) performance and determine whether it offers benefits for commercial PV panels. Figure 7 presents the I-V measurements of the solar cell before and after the deposition of the SiO x C y :H layer fabricated at 100 W. The results show a slight decrease in the induced current, leading to a corresponding reduction in the generated power. The efficiency and fill factor were calculated using Equations ( 5 ) and ( 6 ) [ 47 , 48 ], respectively, and the results are summarized in the Table 3 comparing the uncoated and SiO x C y :H -coated cells. The data indicate a decrease in efficiency by 0.47% and a reduction of 1% in the fill factor. $$\:FF\left(\%\right)=\frac{{V}_{m}\times\:{I}_{m}}{{V}_{oc}\times\:{I}_{sc}}\times\:100$$ 5 $$\:\eta\:\left(\%\right)=\frac{{P}_{m}}{{P}_{i}}\times\:100$$ 6 Although the SiO x C y :H layer has a minimal impact on PV performance, it offers significant advantages in terms of panel maintenance, long-term durability, and reducing high upgrade costs. On the other hand, optimizing the deposition conditions is necessary to reduce the absorption of these hydrophobic layers, ensuring that performance parameters remain stable without compromising light-to-electricity conversion. Table 3 Photovoltaic parameters of uncovered and SiO x C y :H -coated polycrystalline cell manufactured at 100 W under irradiation power of 40 mW/cm 2 . Uncoated Coated with SiO x C y :H Voc (V) 1.74 1.72 Jsc (mA/cm 2 ) 1.64 1.53 I m (mA/cm 2 ) 1.57 1.44 V m (V) 1.47 1.47 Pm (mW/cm 2 ) 2.31 2.12 FF (%) 80.87 79.87 η (%) 5.77 5.3 Photovoltaic cells, like any commercial object, may require a change in appearance. With the added coating, a change in the colorimetric parameters can be achieved. In Fig. 8 you will find the reflected color according to the standard illuminant D65 of the International Commission on Illumination determined by "CODE" [ 49 , 50 ], 10° as often used in the building industry. The standard illuminant D65 of the International Commission on Illumination is used in all colorimetric calculations requiring representative outdoor daylight. where L* returns the color coordinate, calculated for the D65 illumination spectrum and 10° is the viewing angle. The calculated values ​​of the color coordinates are L*=37.42, a*=-0.7, b*=2.67. The color observed on the panels coated with an HMDSO layer deposited at 100 W is represented by a blue dot in Fig. 8 , showing a blend of the three components: red, green, and blue. 4. Conclusions This work examines the water contact angle on SiO x C y :H thin films deposited at different RF powers under atmospheric conditions. Hexamethyldisiloxane (HMDSO) layers were deposited on glass substrates using plasma-enhanced chemical vapor deposition (PECVD), and the sessile drop technique was used to measure the contact angles. The findings reveal that films produced at 200 W and 300 W exhibit hydrophilic properties (θ < 90°), whereas the 100 W film demonstrates hydrophobic behavior. Notably, the contact angle for the 100 W film remains nearly constant at ~ 97° for approximately 14 minutes, highlighting its strong hydrophobic nature. Additionally, applying this hydrophobic layer to a solar cell does not significantly affect its photovoltaic performance. From a wettability perspective, integrating a SiO x C y :H film fabricated at 100 W enhances the surface’s ability to repel water. The deposition of the SiO x C y :H layer on the solar cell leads to a 0.47% drop in efficiency and a 1% decline in the fill factor. Nevertheless, its overall effect on photovoltaic performance is negligible. Declarations Author Contributions: Conceptualization, M.J., A.Z., M.L. and P.B.; validation, M.J., A.Z., A.K.; formal analysis, A.K., I.H.L. and A.A.A; investigation, M.J., A.Z., P.B., M.L. and A.K.; data curation, A.K., I.H.L. and A.A.A; visualization, P.B. and M.L.; writing—original draft preparation, A.K.; writing—review and editing, M.J., A.Z., M.L., P.B., supervision, A.Z.; All authors have read and agreed to the published version of the manuscript. Funding: This work was supported by PARS (ANR-DFG) project N°22003. 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Ferrari, A.C.; Robertson, J.; Ferrari, A.C.; Robertson, J. Raman spectroscopy of amorphous, nanostructured, diamond-like carbon, and nanodiamond. Philos. Trans. R. Soc. London. Ser. A Math. Phys. Eng. Sci. 2004 , 362 , 2477–2512, doi:10.1098/rsta.2004.1452. Meškinis, Š.; Tamulevičienė, A. Structure , Properties and Applications of Diamond Like Nanocomposite ( SiO x Containing DLC ) Films : A Review. 2011 , 17 , 44–46. Yang, W.J.; Sekino, T.; Shim, K.B.; Niihara, K.; Auh, K.H. Microstructure and tribological properties of SiOx/DLC films grown by PECVD. Surf. Coatings Technol. 2005 , 194 , 128–135, doi:https://doi.org/10.1016/j.surfcoat.2004.05.023. Randeniya, L.K.; Bendavid, A.; Martin, P.J.; Amin, M.S.; Preston, E.W. Molecular structure of SiOx-incorporated diamond-like carbon films; evidence for phase segregation. Diam. Relat. Mater. 2009 , 18 , 1167–1173, doi:https://doi.org/10.1016/j.diamond.2009.03.004. Schmieschek, S.; Harting, J. Contact angle determination in multicomponent lattice Boltzmann simulations. Commun. Comput. Phys. 2011 , 9 , 1165–1178, doi:10.4208/cicp.201009.271010s. Kozbial, A.; Li, Z.; Conaway, C.; McGinley, R.; Dhingra, S.; Vahdat, V.; Zhou, F.; Durso, B.; Liu, H.; Li, L. Study on the surface energy of graphene by contact angle measurements. Langmuir 2014 , 30 , 8598–8606, doi:10.1021/la5018328. Kloubek, J. Development of methods for surface free energy determination using contact angles of liquids on solids. Adv. Colloid Interface Sci. 1992 , 38 , 99–142, doi:https://doi.org/10.1016/0001-8686(92)80044-X. Sharma, P.K.; Hanumantha Rao, K. Analysis of different approaches for evaluation of surface energy of microbial cells by contact angle goniometry. Adv. Colloid Interface Sci. 2002 , 98 , 341–463, doi:https://doi.org/10.1016/S0001-8686(02)00004-0. Drelich, J.; Miller, J.D. A critical review of wetting and adhesion phenomena in the preparation of polymer-mineral composites. Mining, Metall. Explor. 1995 , 12 , 197–204, doi:10.1007/BF03403103. Gindl, M.; Sinn, G.; Gindl, W.; Reiterer, A.; Tschegg, S. A comparison of different methods to calculate the surface free energy of wood using contact angle measurements. Colloids Surfaces A Physicochem. Eng. Asp. 2001 , 181 , 279–287, doi:10.1016/S0927-7757(00)00795-0. Hejda, F.; Solaˇ, P.; Kousal, J. Surface Free Energy Determination by Contact Angle Measurements – A Comparison of Various Approaches. WDS’10 Proc. Contrib. Pap. 2010 , 25–30. Palencia, M. Surface free energy of solids by contact angle measurements. J. Sci. with Technol. Appl. 2017 , 2 , 84–93, doi:10.34294/j.jsta.17.2.17. Chibowski, E.; Perea-Carpio, R. Problems of contact angle and solid surface free energy determination. Adv. Colloid Interface Sci. 2002 , 98 , 245–264, doi:https://doi.org/10.1016/S0001-8686(01)00097-5. Zhang, Z. Polar and dispersive surface tension components of water-guanidinium chloride (Gdmcl) binary mixtures. Colloids Surfaces A Physicochem. Eng. Asp. 2023 , 676 , 132223, doi:https://doi.org/10.1016/j.colsurfa.2023.132223. Belyaeva, L.A.; van Deursen, P.M.G.; Barbetsea, K.I.; Schneider, G.F. Hydrophilicity of Graphene in Water through Transparency to Polar and Dispersive Interactions. Adv. Mater. 2018 , 30 , 1703274, doi:https://doi.org/10.1002/adma.201703274. Ergüden, S.A.; Cemal, T. The Effect of Several Parameters on the Performance of CuInS2-based Solar Cells using SCAPS-1D Software. J. Fundam. Appl. Sci. 2017 , 68 , 391–404. Mouloua, D.; Kotbi, A.; Deokar, G.; Kaja, K.; El Marssi, M.; EL Khakani, M.A.; Jouiad, M. Recent Progress in the Synthesis of MoS2 Thin Films for Sensing, Photovoltaic and Plasmonic Applications: A Review. Materials (Basel). 2021 , 14 , 3283, doi:10.3390/ma14123283. Theiss, W. Optical coating design by genetic algorithms. In GnetiCode ; 2019; pp. 29–39. Theiss, W. Analysis of optical spectra by computer simulation - from basics to batch mode. In Theiss Hard-Und Software for Optical Spectroscopy ; Aachen, Germany, 2002. Additional Declarations No competing interests reported. Cite Share Download PDF Status: Published Journal Publication published 12 Aug, 2025 Read the published version in Optical and Quantum Electronics → Version 1 posted Editorial decision: Revision requested 04 Jun, 2025 Reviews received at journal 15 May, 2025 Reviewers agreed at journal 09 May, 2025 Reviewers invited by journal 31 Mar, 2025 Editor assigned by journal 27 Mar, 2025 Submission checks completed at journal 27 Mar, 2025 First submitted to journal 26 Mar, 2025 You are reading this latest preprint version Research Square lets you share your work early, gain feedback from the community, and start making changes to your manuscript prior to peer review in a journal. As a division of Research Square Company, we’re committed to making research communication faster, fairer, and more useful. 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Also discoverable on Platform About Our Team In Review Editorial Policies Advisory Board Help Center Resources Author Services Accessibility API Access RSS feed Manage Cookie Preferences © Research Square 2026 | ISSN 2693-5015 (online) Privacy Policy Terms of Service Do Not Sell My Personal Information {"props":{"pageProps":{"initialData":{"identity":"rs-6311163","acceptedTermsAndConditions":true,"allowDirectSubmit":false,"archivedVersions":[],"articleType":"Research Article","associatedPublications":[],"authors":[{"id":445338983,"identity":"74f41a06-e60b-40f4-abb6-2856cd8e22d9","order_by":0,"name":"Ahmed Kotbi","email":"data:image/png;base64,iVBORw0KGgoAAAANSUhEUgAAAZAAAAAyAQMAAABI0h/eAAAABlBMVEX///8AAABVwtN+AAAACXBIWXMAAA7EAAAOxAGVKw4bAAABCklEQVRIiWNgGAWjYDACCSDmYUgAMhgbH4DZIEEgn5+gFh4JxmYDZC2SDYS1MLBJIAvi1MI/uzvxwRuGNDl76ea2ah6GOzL87Wcf3nhQwSBhjkOPxJ2zmw3nMOQY88gcbLvNw/CMR+JMurFFwhkGCZkDOKy5kbtNmoehIrFHIrHtNu+/wzwGDGlsQDZDnQQOHfI3crf/hmkp5mEAauF/BtTyj0EClxYDoC3MPAw5YC3MYC0SIFsacGsxvJG7WXKOQZoxz52DzZJzQH658YzZIuGYBE4tcjdyN354U5Esxz67/eGHNwx37Pn70xhv/qixwakF6jw46wCMgV8DMjhAUMUoGAWjYBSMPAAAYGVSU37ren0AAAAASUVORK5CYII=","orcid":"","institution":"University of Picardie Jules Verne","correspondingAuthor":true,"prefix":"","firstName":"Ahmed","middleName":"","lastName":"Kotbi","suffix":""},{"id":445338984,"identity":"2b97c550-15dc-4dae-b4fa-f671dd695a0e","order_by":1,"name":"Pierre Barroy","email":"","orcid":"","institution":"University of Picardie Jules Verne","correspondingAuthor":false,"prefix":"","firstName":"Pierre","middleName":"","lastName":"Barroy","suffix":""},{"id":445338985,"identity":"cd950202-ef7f-496a-a773-12cdf546a415","order_by":2,"name":"Michael Lejeune","email":"","orcid":"","institution":"University of Picardie Jules Verne","correspondingAuthor":false,"prefix":"","firstName":"Michael","middleName":"","lastName":"Lejeune","suffix":""},{"id":445338988,"identity":"27ebb726-aa6b-4a44-a898-021c3317f6a7","order_by":3,"name":"Ilham Hamdi Alaoui","email":"","orcid":"","institution":"University of Picardie Jules Verne","correspondingAuthor":false,"prefix":"","firstName":"Ilham","middleName":"Hamdi","lastName":"Alaoui","suffix":""},{"id":445338989,"identity":"7c830a1a-684f-44b6-a77d-adb8f9f095ec","order_by":4,"name":"Abdoul-Azizou Aziraf AFO","email":"","orcid":"","institution":"University of Picardie Jules Verne","correspondingAuthor":false,"prefix":"","firstName":"Abdoul-Azizou","middleName":"Aziraf","lastName":"AFO","suffix":""},{"id":445338992,"identity":"935ca89e-7ab4-4bd9-b633-f7d5e21b38fa","order_by":5,"name":"Andreas Zeinert","email":"","orcid":"","institution":"University of Picardie Jules Verne","correspondingAuthor":false,"prefix":"","firstName":"Andreas","middleName":"","lastName":"Zeinert","suffix":""},{"id":445338996,"identity":"1aa8a2c5-3c93-44ed-9b57-ca866e40d95b","order_by":6,"name":"Mustapha Jouiad","email":"","orcid":"","institution":"University of Picardie Jules Verne","correspondingAuthor":false,"prefix":"","firstName":"Mustapha","middleName":"","lastName":"Jouiad","suffix":""}],"badges":[],"createdAt":"2025-03-26 10:08:14","currentVersionCode":1,"declarations":"","doi":"10.21203/rs.3.rs-6311163/v1","doiUrl":"https://doi.org/10.21203/rs.3.rs-6311163/v1","draftVersion":[],"editorialEvents":[{"content":"https://doi.org/10.1007/s11082-025-08356-0","type":"published","date":"2025-08-12T15:57:14+00:00"}],"editorialNote":"","failedWorkflow":false,"files":[{"id":81034635,"identity":"c488d8d9-d072-46fc-811a-afc2f8b57b3b","added_by":"auto","created_at":"2025-04-21 11:59:34","extension":"png","order_by":1,"title":"Figure 1","display":"","copyAsset":false,"role":"figure","size":139368,"visible":true,"origin":"","legend":"\u003cp\u003eExperimental setup for the deposition of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H films by PECVD technique.\u003c/p\u003e","description":"","filename":"floatimage1.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/93851fbd9511c96f52b90faf.png"},{"id":81034633,"identity":"0b3d9351-7ef7-4a29-84ac-f74288cdb324","added_by":"auto","created_at":"2025-04-21 11:59:34","extension":"png","order_by":2,"title":"Figure 2","display":"","copyAsset":false,"role":"figure","size":150045,"visible":true,"origin":"","legend":"\u003cp\u003e(a) FTIR spectra and (b) Raman spectra of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films fabricated at different RF powers 100, 200 and 300 W.\u003c/p\u003e","description":"","filename":"floatimage2.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/4e023c8a8db6fa9303be59d0.png"},{"id":81034636,"identity":"be70776f-c28e-4d5d-a439-c1b18664bc08","added_by":"auto","created_at":"2025-04-21 11:59:34","extension":"png","order_by":3,"title":"Figure 3","display":"","copyAsset":false,"role":"figure","size":428814,"visible":true,"origin":"","legend":"\u003cp\u003eSEM images of cross sections for films produced at 100 W (a), 200 W (b) and 300 W (c).\u003c/p\u003e","description":"","filename":"floatimage3.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/ef2fbba33b3b30fdb3c6ec8e.png"},{"id":81034638,"identity":"4fdbb5e1-a21f-48c3-aad3-59fae03e3105","added_by":"auto","created_at":"2025-04-21 11:59:34","extension":"png","order_by":4,"title":"Figure 4","display":"","copyAsset":false,"role":"figure","size":222560,"visible":true,"origin":"","legend":"\u003cp\u003eMeasured transmittance (a) and reflectance (b) spectra of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H films fabricated at different RF powers 100, 200 and 300 W.\u003c/p\u003e","description":"","filename":"floatimage4.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/7c8fc139e491f9338746af92.png"},{"id":81034641,"identity":"5cb52f7b-9a7f-44ca-8e4e-67c0317f20d8","added_by":"auto","created_at":"2025-04-21 11:59:34","extension":"png","order_by":5,"title":"Figure 5","display":"","copyAsset":false,"role":"figure","size":145510,"visible":true,"origin":"","legend":"\u003cp\u003eWater contact angles on SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H surfaces fabricated with different RF powers.\u003c/p\u003e","description":"","filename":"floatimage5.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/54fec1d07ecc6e71f8221856.png"},{"id":81035083,"identity":"f65a4e95-0862-4da5-bbd4-eee53b0318bb","added_by":"auto","created_at":"2025-04-21 12:07:35","extension":"png","order_by":6,"title":"Figure 6","display":"","copyAsset":false,"role":"figure","size":505665,"visible":true,"origin":"","legend":"\u003cp\u003eThe variation of contact angle as a function of time for SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H films made at (a) 100 W, (b) 200 W and (c) 300 W.\u003c/p\u003e","description":"","filename":"floatimage6.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/5965ebf7bd12a00da326245f.png"},{"id":81034642,"identity":"391d5807-4f4d-4db0-b185-6a576dd151fe","added_by":"auto","created_at":"2025-04-21 11:59:34","extension":"png","order_by":7,"title":"Figure 7","display":"","copyAsset":false,"role":"figure","size":172046,"visible":true,"origin":"","legend":"\u003cp\u003eI-V measurements on the polycrystalline cell uncovered and covered with a layer of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H manufactured at 100 W under irradiation power of 40 mW/cm\u003csup\u003e2\u003c/sup\u003e.\u003c/p\u003e","description":"","filename":"floatimage7.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/358f8ccd1ece432ab912fda3.png"},{"id":81036026,"identity":"9b2383b1-7fec-4019-9e6c-e8b9a4c925ed","added_by":"auto","created_at":"2025-04-21 12:15:34","extension":"png","order_by":8,"title":"Figure 8","display":"","copyAsset":false,"role":"figure","size":74711,"visible":true,"origin":"","legend":"\u003cp\u003eReflected color according to the standard illuminant D65 using a layer will receive the surface of the PV panel manufactured at 100 W.\u003c/p\u003e","description":"","filename":"floatimage8.png","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/3c2c393e8a1a228e64c9a412.png"},{"id":89310815,"identity":"1db320d8-69e8-498c-bef9-6d5bad3238ae","added_by":"auto","created_at":"2025-08-18 16:10:08","extension":"pdf","order_by":0,"title":"","display":"","copyAsset":false,"role":"manuscript-pdf","size":2734138,"visible":true,"origin":"","legend":"","description":"","filename":"manuscript.pdf","url":"https://assets-eu.researchsquare.com/files/rs-6311163/v1/bb821c22-8bda-4f89-97b0-4b355690652c.pdf"}],"financialInterests":"No competing interests reported.","formattedTitle":"\u003cp\u003eHydrophobic SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e :H Thin Films Deposited by PECVD for Photovoltaic Module Protection\u003c/p\u003e","fulltext":[{"header":"1. Introduction","content":"\u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eHydrophobic coatings have garnered increasing attention due to their broad range of applications. In the case of solar modules, they are key players to prevent water condensation and dust accumulation, that could hinder light absorption and subsequently reduce photovoltaic (PV) conversion efficiency. Applying a hydrophobic coating to PV panels offers an effective solution to minimize wetting and prevent corrosion. The efficiency and longevity of PV panels were reported to be significantly affected by the accumulation on their surface, dust, moisture, and other contaminants [\u003cspan citationid=\"CR1\" class=\"CitationRef\"\u003e1\u003c/span\u003e, \u003cspan citationid=\"CR2\" class=\"CitationRef\"\u003e2\u003c/span\u003e]. To mitigate these issues, hydrophobic coatings have emerged as a promising solution to preserve their performance by reducing losses caused by soiling [\u003cspan citationid=\"CR3\" class=\"CitationRef\"\u003e3\u003c/span\u003e, \u003cspan citationid=\"CR4\" class=\"CitationRef\"\u003e4\u003c/span\u003e]. Various studies explored the impact of hydrophobic coatings on PV modules, demonstrating their effectiveness in improving energy output and minimizing maintenance requirements [\u003cspan additionalcitationids=\"CR6\" citationid=\"CR5\" class=\"CitationRef\"\u003e5\u003c/span\u003e\u0026ndash;\u003cspan citationid=\"CR7\" class=\"CitationRef\"\u003e7\u003c/span\u003e]. Their analysis revealed that dirt accumulation, humidity, and temperature fluctuations negatively impact the PV modules performance [\u003cspan citationid=\"CR8\" class=\"CitationRef\"\u003e8\u003c/span\u003e, \u003cspan citationid=\"CR9\" class=\"CitationRef\"\u003e9\u003c/span\u003e]. Particularly, in humid conditions, dust deposition led to the formation of an adhesive mud layer on the solar cells surface, which reduced their electricity generation by up to 70% [\u003cspan citationid=\"CR5\" class=\"CitationRef\"\u003e5\u003c/span\u003e]. Other studies suggested that applying a self-cleaning and anti-reflective coating to PV modules enhanced their efficiency by approximately 11% compared to uncoated modules [\u003cspan citationid=\"CR5\" class=\"CitationRef\"\u003e5\u003c/span\u003e]. Several approaches have been explored to enhance the durability and efficiency of protective coatings for solar panels. Superhydrophobic films have shown excellent self-cleaning properties, but their poor long-term stability and complex fabrication limit their large-scale application [\u003cspan additionalcitationids=\"CR11\" citationid=\"CR10\" class=\"CitationRef\"\u003e10\u003c/span\u003e\u0026ndash;\u003cspan citationid=\"CR12\" class=\"CitationRef\"\u003e12\u003c/span\u003e]. Additionally, anti-reflective coatings improve light transmission but are often sensitive to environmental conditions and degrade over time [\u003cspan citationid=\"CR13\" class=\"CitationRef\"\u003e13\u003c/span\u003e, \u003cspan citationid=\"CR14\" class=\"CitationRef\"\u003e14\u003c/span\u003e]. Therefore, developing a hybrid solution that combines hydrophobicity, optical transparency, and environmental stability is crucial for optimizing PV panel performance. SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H is one of the compounds, extensively used as protective films owing to their ease of fabrication, versatility, and cost-effective precursors. They were successfully fabricated using plasma-enhanced chemical vapor deposition (PECVD) [\u003cspan additionalcitationids=\"CR16\" citationid=\"CR15\" class=\"CitationRef\"\u003e15\u003c/span\u003e\u0026ndash;\u003cspan citationid=\"CR17\" class=\"CitationRef\"\u003e17\u003c/span\u003e], which enabled precise control over their physicochemical properties. In those studies, the monomer Hexamethyldisiloxane (HMDSO) was employed as a precursor, which was not possible to polymerize using conventional liquid-phase methods. However, under plasma treatment, it undergoes polymerization through radical rearrangement triggered by its dissociation. When processed in a plasma environment, pure HMDSO enabled the formation of stable hydrophobic surfaces due to its high retention of methyl groups [\u003cspan additionalcitationids=\"CR19\" citationid=\"CR18\" class=\"CitationRef\"\u003e18\u003c/span\u003e\u0026ndash;\u003cspan citationid=\"CR20\" class=\"CitationRef\"\u003e20\u003c/span\u003e]. Increasing the oxygen-to-monomer flow ratio in plasma processing was reported to yield a reduction in carbon content [\u003cspan citationid=\"CR21\" class=\"CitationRef\"\u003e21\u003c/span\u003e]. SiO₂-like films deposited from HMDSO/O₂ plasma polymerization were extensively studied and were widely employed as barrier coatings in food packaging applications [\u003cspan citationid=\"CR22\" class=\"CitationRef\"\u003e22\u003c/span\u003e], and PECVD is particularly well-suited for organosilicon compounds and it is a scalable technology, making it preferable for large-area applications. These fabricated polymers exhibited valuable properties such as flexibility, adaptability, and cost-effectiveness, making them widely used in fields like photovoltaics, optical filtering, and packaging [\u003cspan additionalcitationids=\"CR24\" citationid=\"CR23\" class=\"CitationRef\"\u003e23\u003c/span\u003e\u0026ndash;\u003cspan citationid=\"CR25\" class=\"CitationRef\"\u003e25\u003c/span\u003e]. The ability to tailor their surface and optical properties by adjusting deposition conditions significantly expanded their applicability. One of their most critical applications is the deposition of silicon oxide coatings, which was reported to offer excellent barrier and hydrophobic properties [\u003cspan citationid=\"CR26\" class=\"CitationRef\"\u003e26\u003c/span\u003e, \u003cspan citationid=\"CR27\" class=\"CitationRef\"\u003e27\u003c/span\u003e]. Despite SiOxCy:H films have been extensively studied in packaging and optics, their specific application to PV panels remains underexplored. One of the major challenges lies in optimizing the deposition conditions to achieve high-quality coating that preserves the optical efficiency of PV cells while maximizing their protection against environmental contaminants.\u003c/p\u003e \u003cp\u003eIn this context, this study focuses on the characteristics of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films deposited via PECVD using HMDSO as a precursor under varying radio frequency (RF) power levels. The objective is to develop an optimized hydrophobic coating that serves as protective barrier against corrosion and dust accumulation on PV modules surfaces, without compromising their optical and energy performances.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e"},{"header":"2. Materials and Methods","content":"\u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eSiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films were synthesized via PECVD using HMDSO (C\u003csub\u003e6\u003c/sub\u003eH\u003csub\u003e18\u003c/sub\u003eOSi\u003csub\u003e2\u003c/sub\u003e) vapor as a precursor (e.g., Fig.\u0026nbsp;\u003cspan refid=\"Fig1\" class=\"InternalRef\"\u003e1\u003c/span\u003e). During the deposition process, the distance between the electrodes was set to 4.5 cm, the total pressure was kept at 14\u0026times;10\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup3; Torr, and the HMDSO gas flow rate was controlled at 5 sccm. The SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films were deposited out on glass substrates at RF powers 100 W, 200 W and 300 W.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eFourier-transform infrared (FTIR) spectra of the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H films were recorded using a Bruker Vector 33 spectrometer. The vibrational properties were analyzed using a Renishaw micro-Raman spectrometer with a 532 nm excitation source. Optical transmittance and reflectance of the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H films were analyzed using a JASCO V-670 UV-Vis-NIR spectrophotometer equipped with a PIN-757 horizontal sampling integrating sphere. Film thicknesses were evaluated using a Quanta 200 scanning electron microscope (SEM). The contact angle was determined by analyzing the shape of the drops from the image of the shadow of a sessile drop using the DSA25E device from the company KRUSS. The I-V measurements were made on a polycrystalline solar cell of dimension (80*60) mm covered and not covered with a thin layer of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H in order to examine the effect of the latter on the PV performances. I-V measurements on the polycrystalline solar cell were made under irradiation power of 40 mW/cm\u003csup\u003e2\u003c/sup\u003e of an Ossila solar simulator (model no. G2009A1). The colorimetric parameters after the added SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H coating were calculated by Code software to determine the reflected color according to the standard illuminant D65 of the International Commission on Illumination.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e"},{"header":"3. Results","content":"\u003cdiv id=\"Sec4\" class=\"Section2\"\u003e \u003ch2\u003e3.1. Structural properties\u003c/h2\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThe FTIR spectrum of the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin film, recorded in the wavenumber range of 400 to 1500 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;, is presented in Fig.\u0026nbsp;\u003cspan refid=\"Fig2\" class=\"InternalRef\"\u003e2\u003c/span\u003ea. To enhance the signal-to-noise ratio and ensure accurate spectral analysis, the absorption spectrum was acquired by averaging 30 successive scans. The analysis revealed well-defined absorption peaks characteristic of the material's molecular structure. Specifically, a pronounced peak observed at 1004 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1; corresponds to the asymmetric stretching vibrations of Si-O-Si bonds. Additionally, two distinct absorption bands were detected at 797 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1; and 1255 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;, which are attributed to the bending vibrations of Si-(CH\u003csub\u003e3\u003c/sub\u003e)\u003csub\u003ex\u003c/sub\u003e groups. These spectral features are in agreement with previously reported data in the literature [\u003cspan citationid=\"CR19\" class=\"CitationRef\"\u003e19\u003c/span\u003e, \u003cspan citationid=\"CR20\" class=\"CitationRef\"\u003e20\u003c/span\u003e, \u003cspan citationid=\"CR22\" class=\"CitationRef\"\u003e22\u003c/span\u003e, \u003cspan additionalcitationids=\"CR29 CR30\" citationid=\"CR28\" class=\"CitationRef\"\u003e28\u003c/span\u003e\u0026ndash;\u003cspan citationid=\"CR31\" class=\"CitationRef\"\u003e31\u003c/span\u003e], further confirming the chemical composition and bonding characteristics of the deposited films.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThe Raman spectrum of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H films, recorded in the range of 900 to 2000 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;, is shown in Fig.\u0026nbsp;\u003cspan refid=\"Fig2\" class=\"InternalRef\"\u003e2\u003c/span\u003eb. A prominent G peak, associated with the stretching of sp\u003csup\u003e2\u003c/sup\u003e bonds, appears around 1462 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;. Across various carbon-based materials, similarities in Raman spectra are observed, particularly within the 900 to 2000 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1; range, where the characteristic G and D peaks are present at approximately 1560 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1; and 1360 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;, respectively, under visible light excitation. The G peak corresponds to the stretching vibrations of sp\u003csup\u003e2\u003c/sup\u003e bonds in both rings and chains, while the D peak is attributed to the breathing modes of sp\u003csup\u003e2\u003c/sup\u003e atoms within aromatic rings [\u003cspan citationid=\"CR32\" class=\"CitationRef\"\u003e32\u003c/span\u003e, \u003cspan citationid=\"CR33\" class=\"CitationRef\"\u003e33\u003c/span\u003e]. The position of the G peak can vary significantly, typically ranging between 1455 and 1544 cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;, as it is highly sensitive to the strength of C\u0026thinsp;=\u0026thinsp;C bonds [\u003cspan citationid=\"CR34\" class=\"CitationRef\"\u003e34\u003c/span\u003e]. Table\u0026nbsp;\u003cspan refid=\"Tab1\" class=\"InternalRef\"\u003e1\u003c/span\u003e illustrates a reduction in the intensity-to-full-width-at-half-maximum (FWHM) ratio, decreasing from 42.2 to approximately 11. This decline indicates a lower carbon content and, consequently, a reduction in C\u0026thinsp;=\u0026thinsp;C bonds in the sample prepared at 100 W. This phenomenon can be explained by the incorporation of SiO\u003csub\u003ex\u003c/sub\u003e clusters, leading to the substitution of carbon atoms with heavier silicon atoms. As a result, the C\u0026thinsp;=\u0026thinsp;C bonds weaken due to interactions between carbon and the more electropositive silicon atoms [\u003cspan citationid=\"CR35\" class=\"CitationRef\"\u003e35\u003c/span\u003e].\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"gridtable\"\u003e\u003ctable float=\"Yes\" id=\"Tab1\" border=\"1\"\u003e \u003ccaption language=\"En\"\u003e \u003cdiv class=\"CaptionNumber\"\u003eTable 1\u003c/div\u003e \u003cdiv class=\"CaptionContent\"\u003e \u003cp\u003eSiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films fabricated at different RF powers extracted from Raman measurements.\u003c/p\u003e \u003c/div\u003e \u003c/caption\u003e \u003ccolgroup cols=\"4\"\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c1\" colnum=\"1\"\u003e\u003c/div\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c2\" colnum=\"2\"\u003e\u003c/div\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c3\" colnum=\"3\"\u003e\u003c/div\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c4\" colnum=\"4\"\u003e\u003c/div\u003e \u003cthead\u003e \u003ctr\u003e \u003cth align=\"left\" colname=\"c1\"\u003e\u0026nbsp;\u003c/th\u003e \u003cth align=\"left\" colname=\"c2\"\u003e \u003cp\u003e300 W\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c3\"\u003e \u003cp\u003e200 W\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c4\"\u003e \u003cp\u003e100 W\u003c/p\u003e \u003c/th\u003e \u003c/tr\u003e \u003c/thead\u003e \u003ctbody\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003eCentre (cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;)\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c2\"\u003e \u003cp\u003e1462.87\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c3\"\u003e \u003cp\u003e1462.03\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c4\"\u003e \u003cp\u003e1464\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003eFWHM (cm\u003csup\u003e\u0026mdash;\u003c/sup\u003e\u0026sup1;)\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c2\"\u003e \u003cp\u003e100.08\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c3\"\u003e \u003cp\u003e95.81\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c4\"\u003e \u003cp\u003e87.38\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003eArea (a.u.)\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c2\"\u003e \u003cp\u003e902679.3\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c3\"\u003e \u003cp\u003e772464.9\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c4\"\u003e \u003cp\u003e185436.8\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003eIntensity (a.u.)\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c2\"\u003e \u003cp\u003e4224\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c3\"\u003e \u003cp\u003e3792\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c4\"\u003e \u003cp\u003e966\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003eIntensity/ FWHM (a.u.)\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c2\"\u003e \u003cp\u003e42.20\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c3\"\u003e \u003cp\u003e39.57\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"left\" colname=\"c4\"\u003e \u003cp\u003e11.05\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003c/tbody\u003e \u003c/colgroup\u003e \u003c/table\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThe SEM images of the cross-sections of the films deposited at 100 W, 200 W, and 300 W, presented in Fig.\u0026nbsp;\u003cspan refid=\"Fig3\" class=\"InternalRef\"\u003e3\u003c/span\u003ea-c, show a decrease in thickness from approximately 900 nm to around 522 nm. This reduction may be due to the high power, which promotes better arrangement and more orderly condensation on the substrate surface.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003c/div\u003e \u003cdiv id=\"Sec5\" class=\"Section2\"\u003e \u003ch2\u003e3.2. Optical properties\u003c/h2\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThe transmission and reflection curves as a function of wavelength are depicted in Fig.\u0026nbsp;\u003cspan refid=\"Fig4\" class=\"InternalRef\"\u003e4\u003c/span\u003ea\u0026ndash;b. Spectral analysis indicates that the transmittance of the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H film within the visible and near-infrared range gradually increased with wavelength for all samples, varying from approximately 20\u0026ndash;90%. In contrast, the reflectance remained relatively low, ranging between 10% and 20% across the entire spectral range under investigation. Notably, the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H layer deposited from HMDSO at a power of 100 W exhibited the highest transmittance and the lowest reflectance among all analyzed samples. These findings suggest that this specific sample has minimal absorption. The absorptance (A), determined using the relation A\u0026thinsp;=\u0026thinsp;100% \u0026minus; T \u0026ndash; R [\u003cspan citationid=\"CR16\" class=\"CitationRef\"\u003e16\u003c/span\u003e], as illustrated in Fig.\u0026nbsp;\u003cspan refid=\"Fig4\" class=\"InternalRef\"\u003e4\u003c/span\u003eb, further supports this conclusion.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003c/p\u003e \u003c/div\u003e \u003cdiv id=\"Sec6\" class=\"Section2\"\u003e \u003ch2\u003e3.3. Wettability properties\u003c/h2\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThe wettability of each sample with respect to water was assessed by measuring the sessile contact angle, θ, using a drop shape analyzer [\u003cspan citationid=\"CR15\" class=\"CitationRef\"\u003e15\u003c/span\u003e]. The measurement was performed with a 3 \u0026micro;L water droplet, and the contact angle was recorded immediately after deposition. To ensure reliable results, at least four measurements were taken from different areas of the sample surface. These measurements were used to evaluate the hydrophobicity of the thin films. Figure\u0026nbsp;\u003cspan refid=\"Fig5\" class=\"InternalRef\"\u003e5\u003c/span\u003e illustrates the variation in water contact angle on SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H-coated surfaces deposited under different RF power levels. The results show a significant decrease in contact angle as the applied RF power increases. Specifically, the contact angle droped from 97\u0026deg; for the sample deposited at 100 W to approximately 58\u0026deg; for the one fabricated at 300 W.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eIn this study, the Young-Dupr\u0026eacute; model [\u003cspan citationid=\"CR36\" class=\"CitationRef\"\u003e36\u003c/span\u003e] and the Owens-Wendt model (extended Fowkes approach) [\u003cspan citationid=\"CR37\" class=\"CitationRef\"\u003e37\u003c/span\u003e] were employed to determine the surface energy of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H based on contact angle measurements. Various methods derived from surface energy theory have been reported in the literature [\u003cspan additionalcitationids=\"CR39\" citationid=\"CR38\" class=\"CitationRef\"\u003e38\u003c/span\u003e\u0026ndash;\u003cspan citationid=\"CR40\" class=\"CitationRef\"\u003e40\u003c/span\u003e].\u003c/p\u003e \u003cp\u003eWhen a liquid droplet is placed on a flat solid surface, the equilibrium at the three-phase interface is described by Young\u0026rsquo;s equation [\u003cspan citationid=\"CR36\" class=\"CitationRef\"\u003e36\u003c/span\u003e, \u003cspan citationid=\"CR41\" class=\"CitationRef\"\u003e41\u003c/span\u003e, \u003cspan citationid=\"CR42\" class=\"CitationRef\"\u003e42\u003c/span\u003e]:\u003c/p\u003e \u003c/div\u003e \u003cdiv id=\"Equ1\" class=\"Equation\"\u003e \u003cdiv format=\"TEX\" class=\"mathdisplay\" id=\"FileID_Equ1\" name=\"EquationSource\"\u003e\n$$\\:{\\gamma\\:}_{SV}={\\gamma\\:}_{SL}+{\\gamma\\:}_{LV}\\text{c}\\text{o}\\text{s}{\\theta\\:}$$\u003c/div\u003e \u003cdiv class=\"EquationNumber\"\u003e1\u003c/div\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003ewhere γ\u003csub\u003eSV\u003c/sub\u003e is surface free energy of a solid, θ contact angle between the liquid-air interface and the surface, γ\u003csub\u003eSL\u003c/sub\u003e is interfacial tension and γ\u003csub\u003eLV\u003c/sub\u003e is the surface tension of liquid that can be estimated by the Guggenheim-Katayama model we use the following relationship:\u003c/p\u003e \u003c/div\u003e \u003cdiv id=\"Equ2\" class=\"Equation\"\u003e \u003cdiv format=\"TEX\" class=\"mathdisplay\" id=\"FileID_Equ2\" name=\"EquationSource\"\u003e\n$$\\:{\\gamma\\:}_{LV}=\\frac{0.117\\varDelta\\:{H}_{v}}{{V}_{m}^{2/3}}$$\u003c/div\u003e \u003cdiv class=\"EquationNumber\"\u003e2\u003c/div\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003ewhere ΔH\u003csub\u003ev\u003c/sub\u003e is the enthalpy of vaporization (for water ΔH\u003csub\u003ev\u003c/sub\u003e= 40.65 kJ/mol at 25\u0026deg;C), V\u003csub\u003em\u003c/sub\u003e is the molar volume of water is 1.81\u0026times;10\u003csup\u003e\u0026mdash;1\u003c/sup\u003e m\u003csup\u003e3\u003c/sup\u003e/mol. The calculation gives a theoretical surface tension for water of 69.07 mN/m at 25\u0026deg;C which is close to the experimental value of 72.8 mN/m [\u003cspan citationid=\"CR41\" class=\"CitationRef\"\u003e41\u003c/span\u003e, \u003cspan citationid=\"CR43\" class=\"CitationRef\"\u003e43\u003c/span\u003e, \u003cspan citationid=\"CR44\" class=\"CitationRef\"\u003e44\u003c/span\u003e]. In the Young-Dupr\u0026eacute; equation the solid-liquid interfacial tension is equal to the surface tension of the liquid, so Young equation becomes: γ\u003csub\u003eSV\u003c/sub\u003e\u0026thinsp;=\u0026thinsp;γ\u003csub\u003eLV\u003c/sub\u003e (1\u0026thinsp;+\u0026thinsp;cos θ).\u003c/p\u003e \u003cp\u003eThe Owens-Wendt model allows for the decomposition of total surface energy into polar and non-polar (dispersive) components. The polar component corresponds to dipole-dipole interactions, including hydrogen bonding, while the dispersive component represents Van der Waals forces. This distinction provides a deeper insight into surface properties [\u003cspan citationid=\"CR45\" class=\"CitationRef\"\u003e45\u003c/span\u003e, \u003cspan citationid=\"CR46\" class=\"CitationRef\"\u003e46\u003c/span\u003e]. For water, the dispersive component is \u003cspan class=\"InlineEquation\"\u003e\u003cspan class=\"mathinline\"\u003e\\(\\:{\\gamma\\:}_{LV}^{d}\\)\u003c/span\u003e\u003c/span\u003e = 21.8 mN/m, while the polar component is \u003cspan class=\"InlineEquation\"\u003e\u003cspan class=\"mathinline\"\u003e\\(\\:{\\gamma\\:}_{LV}^{p}\\)\u003c/span\u003e\u003c/span\u003e = 51.0 mN/m [\u003cspan citationid=\"CR37\" class=\"CitationRef\"\u003e37\u003c/span\u003e]. It is important to note that the calculated surface energy depends on the chosen model, even when using the same contact angle data. The surface energy of the solid is given by [\u003cspan citationid=\"CR37\" class=\"CitationRef\"\u003e37\u003c/span\u003e]:\u003c/p\u003e \u003c/div\u003e \u003cdiv id=\"Equ3\" class=\"Equation\"\u003e \u003cdiv format=\"TEX\" class=\"mathdisplay\" id=\"FileID_Equ3\" name=\"EquationSource\"\u003e\n$$\\:cos\\theta\\:=-1+2\\:\\left(\\frac{\\sqrt{{\\gamma\\:}_{SV}^{P}{\\gamma\\:}_{LV}^{P}}+\\sqrt{{\\gamma\\:}_{SV}^{d}{\\gamma\\:}_{LV}^{d}}}{{\\gamma\\:}_{LV}}\\right)$$\u003c/div\u003e \u003cdiv class=\"EquationNumber\"\u003e3\u003c/div\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThe polar component of the surface energy is often negligible for a SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H layer due to its chemical composition and limited interaction with polar liquids like water. SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H is a siloxane-based polymer (Si-O-Si) with methyl groups (CH\u003csub\u003e3\u003c/sub\u003e). Since methyl groups are nonpolar, they exhibit weak interactions with polar molecules such as water. As a result, Eq.\u0026nbsp;(\u003cspan refid=\"Equ3\" class=\"InternalRef\"\u003e3\u003c/span\u003e) can be simplified as follows:\u003c/p\u003e \u003c/div\u003e \u003cdiv id=\"Equ4\" class=\"Equation\"\u003e \u003cdiv format=\"TEX\" class=\"mathdisplay\" id=\"FileID_Equ4\" name=\"EquationSource\"\u003e\n$$\\:{\\gamma\\:}_{SV}^{d}=\\left(\\frac{(cos\\theta\\:+1)\\times\\:{\\gamma\\:}_{LV}}{2\\sqrt{{\\gamma\\:}_{LV}^{d}}}\\right)$$\u003c/div\u003e \u003cdiv class=\"EquationNumber\"\u003e4\u003c/div\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eBoth calculation methods indicate that surface energy increases with higher applied RF power, which correlates with a decrease in the contact angle. Table\u0026nbsp;\u003cspan refid=\"Tab2\" class=\"InternalRef\"\u003e2\u003c/span\u003e presents the surface energy values obtained using both approaches as a function of the contact angle. This reduction in contact angle leads to an increase in surface energy. Specifically, as the RF power increases, the surface energy rises from 46.87 mN/m for the film deposited at 100 W to approximately 145.01 mN/m for the film fabricated at 300 W based on the Owens-Wendt model. Similarly, using the Young-Dupr\u0026eacute; model, the surface energy increases from 63.92 mN/m at 100 W to about 111.3 mN/m at 300 W. The surface energy values obtained for the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H coating align well with those reported in reference [\u003cspan citationid=\"CR29\" class=\"CitationRef\"\u003e29\u003c/span\u003e].\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"gridtable\"\u003e\u003ctable float=\"Yes\" id=\"Tab2\" border=\"1\"\u003e \u003ccaption language=\"En\"\u003e \u003cdiv class=\"CaptionNumber\"\u003eTable 2\u003c/div\u003e \u003cdiv class=\"CaptionContent\"\u003e \u003cp\u003eContact angle and surface energy of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films fabricated at different RF powers 100, 200 and 300 W.\u003c/p\u003e \u003c/div\u003e \u003c/caption\u003e \u003ccolgroup cols=\"4\"\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c1\" colnum=\"1\"\u003e\u003c/div\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c2\" colnum=\"2\"\u003e\u003c/div\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c3\" colnum=\"3\"\u003e\u003c/div\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c4\" colnum=\"4\"\u003e\u003c/div\u003e \u003cthead\u003e \u003ctr\u003e \u003cth align=\"left\" colname=\"c1\"\u003e \u003cp\u003ePower (W)\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c2\"\u003e \u003cp\u003eContact angle (\u0026deg;)\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c3\"\u003e \u003cp\u003eSurface energy (mN/m) using Owen-Wendt model\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c4\"\u003e \u003cp\u003eSurface energy (mN/m) using the Young-Dupr\u0026eacute; method\u003c/p\u003e \u003c/th\u003e \u003c/tr\u003e \u003ctr\u003e \u003cth align=\"left\" colname=\"c1\"\u003e \u003cp\u003e100 W\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c2\"\u003e \u003cp\u003e97\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c3\"\u003e \u003cp\u003e46.87\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c4\"\u003e \u003cp\u003e63.92\u003c/p\u003e \u003c/th\u003e \u003c/tr\u003e \u003ctr\u003e \u003cth align=\"left\" colname=\"c1\"\u003e \u003cp\u003e200 W\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c2\"\u003e \u003cp\u003e84\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c3\"\u003e \u003cp\u003e69.55\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c4\"\u003e \u003cp\u003e80.41\u003c/p\u003e \u003c/th\u003e \u003c/tr\u003e \u003c/thead\u003e \u003ctbody\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003e300 W\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e58\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e145.01\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c4\"\u003e \u003cp\u003e\u003cb\u003e111.3\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003c/tbody\u003e \u003c/colgroup\u003e \u003c/table\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThe increase in surface energy is linked to the organic composition of the deposited thin films. The reduction in water contact angle, from 97\u0026deg; for the film deposited at 100 W to approximately 58\u0026deg; for the film deposited at 300 W, reflects a decrease in the hydrophobicity of the material. The presence of organic functional groups such as Si-CH\u003csub\u003e3\u003c/sub\u003e within the film structure contributes to its hydrophobic behavior. This finding suggests that SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H enhances the hydrophobic properties of films synthesized at lower RF power levels. Figure\u0026nbsp;\u003cspan refid=\"Fig6\" class=\"InternalRef\"\u003e6\u003c/span\u003e presents the variation of the contact angle over time for the three fabricated films. The stability of the water contact angle at approximately 95\u0026deg; for the film deposited at 100 W (see Fig.\u0026nbsp;\u003cspan refid=\"Fig6\" class=\"InternalRef\"\u003e6\u003c/span\u003ea) can be attributed to the stabilization of the film's chemical structure.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eFTIR analysis indicates that increasing the RF power enhances monomer fragmentation in the plasma phase, leading to a decrease in Si\u0026ndash;CH\u003csub\u003e3\u003c/sub\u003e bonds while promoting the formation of Si\u0026ndash;O\u0026ndash;Si bonds. These results align with those reported in reference [\u003cspan citationid=\"CR28\" class=\"CitationRef\"\u003e28\u003c/span\u003e]. In contrast, at lower RF power levels, the deposited coatings exhibit a greater degree of precursor linearization, characterized by the development of Si\u0026ndash;O\u0026ndash;Si chains and a higher retention of Si\u0026ndash;CH\u003csub\u003e3\u003c/sub\u003e bonds. The film\u0026rsquo;s structure and composition play a crucial role in determining its hydrophobic properties. Specifically, films synthesized at lower power levels, which contain a higher concentration of Si\u0026ndash;CH\u003csub\u003e3\u003c/sub\u003e bonds, exhibit stronger hydrophobic behavior.\u003c/p\u003e \u003cp\u003eA layer of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H was deposited on a polycrystalline solar cell to protect it from corrosion and dust accumulation caused by water droplets remaining on the surface after rainfall. This study aims to assess the impact of this coating on photovoltaic (PV) performance and determine whether it offers benefits for commercial PV panels.\u003c/p\u003e \u003cp\u003eFigure \u003cspan refid=\"Fig7\" class=\"InternalRef\"\u003e7\u003c/span\u003e presents the I-V measurements of the solar cell before and after the deposition of the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H layer fabricated at 100 W. The results show a slight decrease in the induced current, leading to a corresponding reduction in the generated power. The efficiency and fill factor were calculated using Equations (\u003cspan refid=\"Equ5\" class=\"InternalRef\"\u003e5\u003c/span\u003e) and (\u003cspan refid=\"Equ6\" class=\"InternalRef\"\u003e6\u003c/span\u003e) [\u003cspan citationid=\"CR47\" class=\"CitationRef\"\u003e47\u003c/span\u003e, \u003cspan citationid=\"CR48\" class=\"CitationRef\"\u003e48\u003c/span\u003e], respectively, and the results are summarized in the Table \u003cspan refid=\"Tab3\" class=\"InternalRef\"\u003e3\u003c/span\u003e comparing the uncoated and SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H -coated cells. The data indicate a decrease in efficiency by 0.47% and a reduction of 1% in the fill factor.\u003c/p\u003e \u003c/div\u003e \u003cdiv id=\"Equ5\" class=\"Equation\"\u003e \u003cdiv format=\"TEX\" class=\"mathdisplay\" id=\"FileID_Equ5\" name=\"EquationSource\"\u003e\n$$\\:FF\\left(\\%\\right)=\\frac{{V}_{m}\\times\\:{I}_{m}}{{V}_{oc}\\times\\:{I}_{sc}}\\times\\:100$$\u003c/div\u003e \u003cdiv class=\"EquationNumber\"\u003e5\u003c/div\u003e\u003c/div\u003e \u003cdiv id=\"Equ6\" class=\"Equation\"\u003e \u003cdiv format=\"TEX\" class=\"mathdisplay\" id=\"FileID_Equ6\" name=\"EquationSource\"\u003e\n$$\\:\\eta\\:\\left(\\%\\right)=\\frac{{P}_{m}}{{P}_{i}}\\times\\:100$$\u003c/div\u003e \u003cdiv class=\"EquationNumber\"\u003e6\u003c/div\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eAlthough the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H layer has a minimal impact on PV performance, it offers significant advantages in terms of panel maintenance, long-term durability, and reducing high upgrade costs. On the other hand, optimizing the deposition conditions is necessary to reduce the absorption of these hydrophobic layers, ensuring that performance parameters remain stable without compromising light-to-electricity conversion.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"gridtable\"\u003e\u003ctable float=\"Yes\" id=\"Tab3\" border=\"1\"\u003e \u003ccaption language=\"En\"\u003e \u003cdiv class=\"CaptionNumber\"\u003eTable 3\u003c/div\u003e \u003cdiv class=\"CaptionContent\"\u003e \u003cp\u003ePhotovoltaic parameters of uncovered and SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H -coated polycrystalline cell manufactured at 100 W under irradiation power of 40 mW/cm\u003csup\u003e2\u003c/sup\u003e.\u003c/p\u003e \u003c/div\u003e \u003c/caption\u003e \u003ccolgroup cols=\"3\"\u003e \u003cdiv align=\"left\" class=\"colspec\" colname=\"c1\" colnum=\"1\"\u003e\u003c/div\u003e \u003cdiv align=\"char\" char=\".\" class=\"colspec\" colname=\"c2\" colnum=\"2\"\u003e\u003c/div\u003e \u003cdiv align=\"char\" char=\".\" class=\"colspec\" colname=\"c3\" colnum=\"3\"\u003e\u003c/div\u003e \u003cthead\u003e \u003ctr\u003e \u003cth align=\"left\" colname=\"c1\"\u003e\u0026nbsp;\u003c/th\u003e \u003cth align=\"left\" colname=\"c2\"\u003e \u003cp\u003eUncoated\u003c/p\u003e \u003c/th\u003e \u003cth align=\"left\" colname=\"c3\"\u003e \u003cp\u003eCoated with SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H\u003c/p\u003e \u003c/th\u003e \u003c/tr\u003e \u003c/thead\u003e \u003ctbody\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003eVoc (V)\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e1.74\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e1.72\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003eJsc (mA/cm\u003c/b\u003e\u003csup\u003e\u003cb\u003e2\u003c/b\u003e\u003c/sup\u003e\u003cb\u003e)\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e1.64\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e1.53\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003eI\u003c/b\u003e\u003csub\u003e\u003cb\u003em\u003c/b\u003e\u003c/sub\u003e \u003cb\u003e(mA/cm\u003c/b\u003e\u003csup\u003e\u003cb\u003e2\u003c/b\u003e\u003c/sup\u003e\u003cb\u003e)\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e1.57\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e1.44\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003eV\u003c/b\u003e\u003csub\u003e\u003cb\u003em\u003c/b\u003e\u003c/sub\u003e \u003cb\u003e(V)\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e1.47\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e1.47\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003ePm (mW/cm\u003c/b\u003e\u003csup\u003e\u003cb\u003e2\u003c/b\u003e\u003c/sup\u003e\u003cb\u003e)\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e2.31\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e2.12\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003eFF (%)\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e80.87\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e79.87\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003ctr\u003e \u003ctd align=\"left\" colname=\"c1\"\u003e \u003cp\u003e\u003cb\u003eη (%)\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c2\"\u003e \u003cp\u003e\u003cb\u003e5.77\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003ctd align=\"char\" char=\".\" colname=\"c3\"\u003e \u003cp\u003e\u003cb\u003e5.3\u003c/b\u003e\u003c/p\u003e \u003c/td\u003e \u003c/tr\u003e \u003c/tbody\u003e \u003c/colgroup\u003e \u003c/table\u003e\u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003ePhotovoltaic cells, like any commercial object, may require a change in appearance. With the added coating, a change in the colorimetric parameters can be achieved. In Fig.\u0026nbsp;\u003cspan refid=\"Fig8\" class=\"InternalRef\"\u003e8\u003c/span\u003e you will find the reflected color according to the standard illuminant D65 of the International Commission on Illumination determined by \"CODE\" [\u003cspan citationid=\"CR49\" class=\"CitationRef\"\u003e49\u003c/span\u003e, \u003cspan citationid=\"CR50\" class=\"CitationRef\"\u003e50\u003c/span\u003e], 10\u0026deg; as often used in the building industry. The standard illuminant D65 of the International Commission on Illumination is used in all colorimetric calculations requiring representative outdoor daylight.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003ewhere L* returns the color coordinate, calculated for the D65 illumination spectrum and 10\u0026deg; is the viewing angle. The calculated values ​​of the color coordinates are L*=37.42, a*=-0.7, b*=2.67. The color observed on the panels coated with an HMDSO layer deposited at 100 W is represented by a blue dot in Fig.\u0026nbsp;\u003cspan refid=\"Fig8\" class=\"InternalRef\"\u003e8\u003c/span\u003e, showing a blend of the three components: red, green, and blue.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e \u003c/div\u003e"},{"header":"4. Conclusions","content":"\u003cp\u003e \u003cdiv class=\"BlockQuote\"\u003e \u003cp\u003eThis work examines the water contact angle on SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films deposited at different RF powers under atmospheric conditions. Hexamethyldisiloxane (HMDSO) layers were deposited on glass substrates using plasma-enhanced chemical vapor deposition (PECVD), and the sessile drop technique was used to measure the contact angles. The findings reveal that films produced at 200 W and 300 W exhibit hydrophilic properties (θ\u0026thinsp;\u0026lt;\u0026thinsp;90\u0026deg;), whereas the 100 W film demonstrates hydrophobic behavior. Notably, the contact angle for the 100 W film remains nearly constant at ~\u0026thinsp;97\u0026deg; for approximately 14 minutes, highlighting its strong hydrophobic nature. Additionally, applying this hydrophobic layer to a solar cell does not significantly affect its photovoltaic performance. From a wettability perspective, integrating a SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H film fabricated at 100 W enhances the surface\u0026rsquo;s ability to repel water. The deposition of the SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H layer on the solar cell leads to a 0.47% drop in efficiency and a 1% decline in the fill factor. Nevertheless, its overall effect on photovoltaic performance is negligible.\u003c/p\u003e \u003c/div\u003e \u003c/p\u003e"},{"header":"Declarations","content":"\u003cp\u003e\u003cstrong\u003eAuthor Contributions:\u003c/strong\u003e Conceptualization, M.J., A.Z., M.L. and P.B.; validation, M.J., A.Z., A.K.; formal analysis, A.K., I.H.L. and A.A.A; investigation, M.J., A.Z., P.B., M.L. and A.K.; data curation, A.K., I.H.L. and A.A.A; visualization, P.B. and M.L.; writing\u0026mdash;original draft preparation, A.K.; writing\u0026mdash;review and editing, M.J., A.Z., M.L., P.B., supervision, A.Z.; All authors have read and agreed to the published version of the manuscript.\u003c/p\u003e\n\u003cp\u003e\u003cstrong\u003eFunding:\u003c/strong\u003e This work was supported by PARS (ANR-DFG) project N\u0026deg;22003.\u003c/p\u003e\n\u003cp\u003e\u003cstrong\u003eData Availability Statement:\u003c/strong\u003e The original contributions presented in the study are included in the article, further inquiries can be directed to the corresponding author.\u003c/p\u003e\n\u003cp\u003e\u003cstrong\u003eConflicts of Interest:\u003c/strong\u003e The authors declare no conflicts of interest.\u003c/p\u003e"},{"header":"References","content":"\u003col\u003e\n\u003cli\u003eSaid, S.Z.; Islam, S.Z.; Radzi, N.H.; Wekesa, C.W.; Altimania, M.; Uddin, J. 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In \u003cem\u003eTheiss Hard-Und Software for Optical Spectroscopy\u003c/em\u003e; Aachen, Germany, 2002.\u003c/li\u003e\n\u003c/ol\u003e"}],"fulltextSource":"","fullText":"","funders":[],"hasAdminPriorityOnWorkflow":false,"hasManuscriptDocX":true,"hasOptedInToPreprint":true,"hasPassedJournalQc":"","hasAnyPriority":false,"hideJournal":false,"highlight":"","institution":"","isAcceptedByJournal":true,"isAuthorSuppliedPdf":false,"isDeskRejected":"","isHiddenFromSearch":false,"isInQc":false,"isInWorkflow":false,"isPdf":false,"isPdfUpToDate":true,"isWithdrawnOrRetracted":false,"journal":{"display":true,"email":"[email protected]","identity":"optical-and-quantum-electronics","isNatureJournal":false,"hasQc":true,"allowDirectSubmit":false,"externalIdentity":"oqel","sideBox":"Learn more about [Optical and Quantum Electronics](https://www.springer.com/journal/11082)","snPcode":"11082","submissionUrl":"https://submission.nature.com/new-submission/11082/3","title":"Optical and Quantum Electronics","twitterHandle":"","acdcEnabled":true,"dfaEnabled":true,"editorialSystem":"em","reportingPortfolio":"Springer Hybrid","inReviewEnabled":true,"inReviewRevisionsEnabled":false},"keywords":"SiOxCy:H, PECVD, hexamethyldisiloxane, contact angle, wettability, photovoltaic","lastPublishedDoi":"10.21203/rs.3.rs-6311163/v1","lastPublishedDoiUrl":"https://doi.org/10.21203/rs.3.rs-6311163/v1","license":{"name":"CC BY 4.0","url":"https://creativecommons.org/licenses/by/4.0/"},"manuscriptAbstract":"\u003cp\u003eThis study explores the optimization of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films fabricated under varying radio frequency power conditions to achieve enhanced water repeal while preserving photovoltaic (PV) performance. Thin films derived from hexamethyldisiloxane were deposited on glass substrates via plasma-enhanced chemical vapor deposition (PECVD). The sessile drop technique was used to assess the water contact angle. Our findings indicate that SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H films deposited at 200 W and 300 W exhibit hydrophilic behavior (θ\u0026thinsp;\u0026lt;\u0026thinsp;90\u0026deg;), whereas the film produced at 100 W achieves hydrophobicity (θ\u0026thinsp;\u0026gt;\u0026thinsp;90\u0026deg;), optimizing surface wettability for water-repellent applications. Notably, applying the 100 W film to a solar cell resulted in minimal efficiency loss (0.47%) and only a 1% decrease in fill factor, confirming that PV performance remained practically unaltered. These findings highlight the potential of SiO\u003csub\u003ex\u003c/sub\u003eC\u003csub\u003ey\u003c/sub\u003e:H thin films fabricated at optimized conditions to provide effective protection against moisture without compromising solar cell functionality.\u003c/p\u003e","manuscriptTitle":"Hydrophobic SiOxCy :H Thin Films Deposited by PECVD for Photovoltaic Module Protection","msid":"","msnumber":"","nonDraftVersions":[{"code":1,"date":"2025-04-21 11:59:30","doi":"10.21203/rs.3.rs-6311163/v1","editorialEvents":[{"type":"communityComments","content":0},{"type":"decision","content":"Revision requested","date":"2025-06-04T21:21:28+00:00","index":"","fulltext":""},{"type":"editorInvitedReview","content":"","date":"2025-05-15T15:45:01+00:00","index":"hide","fulltext":""},{"type":"reviewerAgreed","content":"78333354347185994406167699667071167116","date":"2025-05-09T13:21:47+00:00","index":"hide","fulltext":""},{"type":"reviewersInvited","content":"","date":"2025-03-31T17:42:59+00:00","index":"","fulltext":""},{"type":"editorAssigned","content":"","date":"2025-03-27T05:33:19+00:00","index":"","fulltext":""},{"type":"checksComplete","content":"","date":"2025-03-27T04:14:17+00:00","index":"","fulltext":""},{"type":"submitted","content":"Optical and Quantum Electronics","date":"2025-03-26T09:55:25+00:00","index":"","fulltext":""}],"status":"published","journal":{"display":true,"email":"[email protected]","identity":"optical-and-quantum-electronics","isNatureJournal":false,"hasQc":true,"allowDirectSubmit":false,"externalIdentity":"oqel","sideBox":"Learn more about [Optical and Quantum Electronics](https://www.springer.com/journal/11082)","snPcode":"11082","submissionUrl":"https://submission.nature.com/new-submission/11082/3","title":"Optical and Quantum Electronics","twitterHandle":"","acdcEnabled":true,"dfaEnabled":true,"editorialSystem":"em","reportingPortfolio":"Springer Hybrid","inReviewEnabled":true,"inReviewRevisionsEnabled":false}}],"origin":"","ownerIdentity":"f56295d8-159e-461e-bf49-9f9078ed058b","owner":[],"postedDate":"April 21st, 2025","published":true,"recentEditorialEvents":[],"rejectedJournal":[],"revision":"","amendment":"","status":"published-in-journal","subjectAreas":[],"tags":[],"updatedAt":"2025-08-18T16:06:53+00:00","versionOfRecord":{"articleIdentity":"rs-6311163","link":"https://doi.org/10.1007/s11082-025-08356-0","journal":{"identity":"optical-and-quantum-electronics","isVorOnly":false,"title":"Optical and Quantum Electronics"},"publishedOn":"2025-08-12 15:57:14","publishedOnDateReadable":"August 12th, 2025"},"versionCreatedAt":"2025-04-21 11:59:30","video":"","vorDoi":"10.1007/s11082-025-08356-0","vorDoiUrl":"https://doi.org/10.1007/s11082-025-08356-0","workflowStages":[]},"version":"v1","identity":"rs-6311163","journalConfig":"researchsquare"},"__N_SSP":true},"page":"/article/[identity]/[[...version]]","query":{"redirect":"/article/rs-6311163","identity":"rs-6311163","version":["v1"]},"buildId":"8U1c8b4HqxoKbykW_rLl7","isFallback":false,"isExperimentalCompile":false,"dynamicIds":[84888],"gssp":true,"scriptLoader":[]}