Optical and dielectric properties of polycrystalline gallium ferrite thin films on Pt/Si  substrates

In this work, GaFeO 3 thin films are deposited on Pt/Si substrates using sol-gel spin coating technique. The effect of these films on different properties such as: structural, optical and electrical properties are investigated. X- ray diffraction (XRD) confirms that GaFeO 3 has orthorhombic Pc2 1 n symmetry. Scanning electron microscopy reveals the uniform distribution of sol and crack free nature of the films. The optical absorption spectrum was recorded using DRS UV-Vis which showed the thin films are absorbed in the visible region. We have also performed experimentally which determines the flat band potential using Mott-Schottky equation. The width of the space charge region and charge carrier concentration of the thin films is also calculated. The dielectric properties of the thin films are also studied in this paper. This work opens up the possibility for the polycrystalline GaFeO 3 thin films to be used as phototelectrodes.