Predicting Magnetron Sputtering Deposition Rate through Process Parameters Using Supervised Machine Learning

Predicting Magnetron Sputtering Deposition Rate through Process Parameters Using Supervised Machine Learning | Research Square window.SnipcartSettings = { analytics: { enabled: false } }; (function() { var accessVector = localStorage.getItem('access_vector') || ''; window.dataLayer = window.dataLayer || []; if (accessVector) { window.dataLayer.push({ user: { profile: { profileInfo: { snid: accessVector } } } }); } })(); (function(w,d,s,l,i){w[l]=w[l]||[];w[l].push({'gtm.start':new Date().getTime(),event:'gtm.js'});var f=d.getElementsByTagName(s)[0],j=d.createElement(s),dl=l!='dataLayer'?'&l='+l:'';j.async=true;j.src='https://www.googletagmanager.com/gtm.js?id='+i+dl;f.parentNode.insertBefore(j,f);})(window,document,'script','dataLayer','GTM-K279D39R'); Browse Preprints In Review Journals COVID-19 Preprints AJE Video Bytes Research Tools Research Promotion AJE Professional Editing AJE Rubriq About Preprint Platform In Review Editorial Policies Our Team Advisory Board Help Center Sign In Submit a Preprint Cite Share Download PDF Research Article Predicting Magnetron Sputtering Deposition Rate through Process Parameters Using Supervised Machine Learning Sri Vishnu Jami, Sakti Prasanna Muduli, Paresh Kale This is a preprint; it has not been peer reviewed by a journal. https://doi.org/ 10.21203/rs.3.rs-7787957/v1 This work is licensed under a CC BY 4.0 License Status: Under Review Version 1 posted 6 You are reading this latest preprint version Abstract Magnetron sputtering, a widely used physical vapor deposition method, is a plasma-matter interaction process. The magnetron sputtering application includes semiconductor fabrication, optics, and surface coating. The key roles of sputtering in the semiconductor industry are forming interconnects, barrier layers, electrode contacts in solar cells, integrated circuits, and other microelectronic devices. Despite wide applications and impact, rare mathematical analyses exist for predicting the deposition rate derived from first principles. A supervised machine learning approach uses process parameters such as power, target-substrate distance, and target material to determine the deposition rate. The work explains the process parameters and their impact on the deposition rate. Seven regression machine learning models are briefly discussed, with the relevance for model sputtering deposition rate, which are evaluated using parameters such as Mean Squared Error, Mean Absolute Error, and Coefficient of determination ( R 2 ). The average performing models are tree-based regression models with R 2 above 0.9 and minimal error. Random Forest and XGBoost are the top-performing models, with R² of 0.96 and 0.97, respectively. Predicting the sputter deposition rate using optimized machine learning is a novel approach to reduce experimental time and expenditure. Substrate-target distance hyperparameters Sputtering pressure Coefficient of determination Regression models Full Text Additional Declarations No competing interests reported. Cite Share Download PDF Status: Under Review Version 1 posted Reviews received at journal 03 Feb, 2026 Reviewers agreed at journal 15 Dec, 2025 Reviewers invited by journal 12 Oct, 2025 Editor assigned by journal 12 Oct, 2025 Submission checks completed at journal 09 Oct, 2025 First submitted to journal 06 Oct, 2025 You are reading this latest preprint version Research Square lets you share your work early, gain feedback from the community, and start making changes to your manuscript prior to peer review in a journal. As a division of Research Square Company, we’re committed to making research communication faster, fairer, and more useful. We do this by developing innovative software and high quality services for the global research community. Our growing team is made up of researchers and industry professionals working together to solve the most critical problems facing scientific publishing. Also discoverable on Platform About Our Team In Review Editorial Policies Advisory Board Help Center Resources Author Services Accessibility API Access RSS feed Manage Cookie Preferences © Research Square 2026 | ISSN 2693-5015 (online) Privacy Policy Terms of Service Do Not Sell My Personal Information {"props":{"pageProps":{"initialData":{"identity":"rs-7787957","acceptedTermsAndConditions":true,"allowDirectSubmit":false,"archivedVersions":[],"articleType":"Research Article","associatedPublications":[],"authors":[{"id":533693593,"identity":"c833c891-96d1-4c48-a303-a18b215d9ce6","order_by":0,"name":"Sri Vishnu Jami","email":"","orcid":"","institution":"VIT Vellore","correspondingAuthor":false,"prefix":"","firstName":"Sri","middleName":"Vishnu","lastName":"Jami","suffix":""},{"id":533693594,"identity":"34b90c33-7319-4022-a990-a73d6ff4c28b","order_by":1,"name":"Sakti Prasanna Muduli","email":"","orcid":"","institution":"NIT Rourkela","correspondingAuthor":false,"prefix":"","firstName":"Sakti","middleName":"Prasanna","lastName":"Muduli","suffix":""},{"id":533693595,"identity":"9c75e986-3e85-499f-92f5-96f3a8c89a73","order_by":2,"name":"Paresh Kale","email":"data:image/png;base64,iVBORw0KGgoAAAANSUhEUgAAAZAAAAAyAQMAAABI0h/eAAAABlBMVEX///8AAABVwtN+AAAACXBIWXMAAA7EAAAOxAGVKw4bAAAA+0lEQVRIie2RsUoDQRCG51iYbfaSdiVFXmHDwoVAxFcZCaxNBCFNSquxCaT1NdKYlIG0BlsLEa/ZyuJsQg4s3EiwkVu1s9iv/JmP+eEHSCT+K9k1QQvEGgjAtD4j8wsFAQmIwOAfFBXOvpQIfbkty3rluihnu5dy/2wRRFnB1VOjMphdWJvfj3ustktDNClCQ6vB+EbFrB12Mp5mrC/vNBENQ7Ei5Jtm5cHLuubpGXdf/VGRu7jy6BByHp+zVnhQQjEV/zK49aKTsxuxcoUmRxaFmmiKKP22y95qHp3O5caf7IfUm8ubRVW9R4p9jwQc9mnmp5UTiUQiAfABif9KJMC4COMAAAAASUVORK5CYII=","orcid":"","institution":"NIT Rourkela","correspondingAuthor":true,"prefix":"","firstName":"Paresh","middleName":"","lastName":"Kale","suffix":""}],"badges":[],"createdAt":"2025-10-06 04:53:25","currentVersionCode":1,"declarations":"","doi":"10.21203/rs.3.rs-7787957/v1","doiUrl":"https://doi.org/10.21203/rs.3.rs-7787957/v1","draftVersion":[],"editorialEvents":[],"editorialNote":"","failedWorkflow":false,"files":[{"id":94465799,"identity":"4bef1320-ce81-44e3-923c-4456f028aad4","added_by":"auto","created_at":"2025-10-27 15:18:50","extension":"docx","order_by":0,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":1472335,"visible":true,"origin":"","legend":"","description":"","filename":"ManuscriptMLforSputteringJKPS.docx","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/4f3bd6591ee79f044e485560.docx"},{"id":94465921,"identity":"d578dcab-b0b9-42db-99ab-076d301023c5","added_by":"auto","created_at":"2025-10-27 15:19:16","extension":"json","order_by":1,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":5075,"visible":true,"origin":"","legend":"","description":"","filename":"9db85df1ed834e868eb0a4e533da7f6e.json","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/7fdafff53b6cef00e1d4c964.json"},{"id":94465803,"identity":"1fd0cb36-44c5-448d-99e9-8bb9ba0c35db","added_by":"auto","created_at":"2025-10-27 15:18:53","extension":"xml","order_by":2,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":130856,"visible":true,"origin":"","legend":"","description":"","filename":"9db85df1ed834e868eb0a4e533da7f6e1enriched.xml","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/ed0c8a2773e1ce551fa45f63.xml"},{"id":94465794,"identity":"dcb73d87-460a-4e7a-90bd-cc38143e19a7","added_by":"auto","created_at":"2025-10-27 15:18:48","extension":"jpeg","order_by":4,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":40418,"visible":true,"origin":"","legend":"","description":"","filename":"floatimage1.jpeg","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/5607575aae407b685b64e5d7.jpeg"},{"id":94465820,"identity":"196feb18-ee3e-402d-aa6f-c174e987ff32","added_by":"auto","created_at":"2025-10-27 15:18:59","extension":"wmf","order_by":5,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":26972,"visible":true,"origin":"","legend":"","description":"","filename":"floatimage2.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/aac19d42c3facc7030a74b4d.wmf"},{"id":94465920,"identity":"64a5a138-77dd-4ad9-b32a-fb7321151a89","added_by":"auto","created_at":"2025-10-27 15:19:16","extension":"jpeg","order_by":6,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":137408,"visible":true,"origin":"","legend":"","description":"","filename":"groupimage1.jpeg","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/cd06c97fe3f9527e79f1ac24.jpeg"},{"id":94465668,"identity":"bfb6f59f-7452-4a62-bb70-d4466bbd3fbc","added_by":"auto","created_at":"2025-10-27 15:18:05","extension":"jpeg","order_by":7,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":21144,"visible":true,"origin":"","legend":"","description":"","filename":"groupimage2.jpeg","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/7f36d98d2a027f923f077c50.jpeg"},{"id":94465671,"identity":"05b96e65-9f99-4f7a-b1a8-05f42ffced0e","added_by":"auto","created_at":"2025-10-27 15:18:06","extension":"wmf","order_by":8,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":186750,"visible":true,"origin":"","legend":"","description":"","filename":"image1.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/8fba86623e3978d7c5cd49dd.wmf"},{"id":94465723,"identity":"d4d0ccd2-ec6b-41ff-b141-2efc0e089d1c","added_by":"auto","created_at":"2025-10-27 15:18:29","extension":"wmf","order_by":9,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":186630,"visible":true,"origin":"","legend":"","description":"","filename":"image2.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/8b3517950839b16663b0fe18.wmf"},{"id":94465892,"identity":"cc64d79c-9268-4d53-9579-d8f2fea7cc0a","added_by":"auto","created_at":"2025-10-27 15:19:09","extension":"wmf","order_by":10,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":186254,"visible":true,"origin":"","legend":"","description":"","filename":"image3.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/4819f7f8dee15290ae3457c0.wmf"},{"id":94466102,"identity":"e89ccc21-636d-4e32-af1b-339986445770","added_by":"auto","created_at":"2025-10-27 15:19:32","extension":"wmf","order_by":11,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":186520,"visible":true,"origin":"","legend":"","description":"","filename":"image4.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/1a4067149664615af6f53c9d.wmf"},{"id":94465805,"identity":"d6fb94ae-1f23-4744-bd27-de1e240930db","added_by":"auto","created_at":"2025-10-27 15:18:54","extension":"wmf","order_by":12,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":186602,"visible":true,"origin":"","legend":"","description":"","filename":"image5.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/b5e2976b4cc918baa1124c07.wmf"},{"id":94465812,"identity":"736570eb-1b7a-45ef-b6d9-6d62d7c62d1f","added_by":"auto","created_at":"2025-10-27 15:18:56","extension":"wmf","order_by":13,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":186542,"visible":true,"origin":"","legend":"","description":"","filename":"image6.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/24994cad5016aa7a16101c07.wmf"},{"id":94465811,"identity":"9ddbb067-d706-4e7a-92eb-acba8451854a","added_by":"auto","created_at":"2025-10-27 15:18:56","extension":"wmf","order_by":14,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":186710,"visible":true,"origin":"","legend":"","description":"","filename":"image7.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/d9f9337b8991030f0bb3c971.wmf"},{"id":94465806,"identity":"e6508de1-c940-43a7-91cb-631950836353","added_by":"auto","created_at":"2025-10-27 15:18:54","extension":"wmf","order_by":15,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":26972,"visible":true,"origin":"","legend":"","description":"","filename":"floatimage2.wmf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/ff0a49b1f9eb774c3cb41c8f.wmf"},{"id":94465825,"identity":"5fddecfd-dcec-41fd-9319-a3c3d36d7ea4","added_by":"auto","created_at":"2025-10-27 15:19:01","extension":"png","order_by":16,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":9061,"visible":true,"origin":"","legend":"","description":"","filename":"Onlinefloatimage1.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/111399377bc448eecf951a85.png"},{"id":94465795,"identity":"66c8580e-78b2-48dd-a700-73ee96bf3bd4","added_by":"auto","created_at":"2025-10-27 15:18:49","extension":"png","order_by":17,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":39017,"visible":true,"origin":"","legend":"","description":"","filename":"Onlinefloatimage2.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/5547c11ad46a73df98d2fe85.png"},{"id":94465937,"identity":"5e5349d2-22b6-4586-87cf-4ab8d379b3d8","added_by":"auto","created_at":"2025-10-27 15:19:17","extension":"png","order_by":18,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":33018,"visible":true,"origin":"","legend":"","description":"","filename":"Onlinegroupimage1.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/3bff9f089cc2aaa3c47c0852.png"},{"id":94465935,"identity":"0d95b87c-cc33-4e9e-8f5f-05f0dc0c50b2","added_by":"auto","created_at":"2025-10-27 15:19:17","extension":"png","order_by":19,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":7021,"visible":true,"origin":"","legend":"","description":"","filename":"Onlinegroupimage2.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/7bbbcd16943a3038e1baf2ec.png"},{"id":94465735,"identity":"00ace9d1-c47d-4d9e-9d00-f9c0ad5438cf","added_by":"auto","created_at":"2025-10-27 15:18:40","extension":"png","order_by":20,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":39675,"visible":true,"origin":"","legend":"","description":"","filename":"Onlineimage1.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/5e3fbe2deec2a0544ac66ff6.png"},{"id":94465724,"identity":"263d6648-08a0-4364-82e0-521c039479a1","added_by":"auto","created_at":"2025-10-27 15:18:29","extension":"png","order_by":21,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":39422,"visible":true,"origin":"","legend":"","description":"","filename":"Onlineimage2.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/f8eaa84e799428fd5a1bc91e.png"},{"id":94465814,"identity":"bedecc09-09e7-45fb-861a-1611fb31be42","added_by":"auto","created_at":"2025-10-27 15:18:57","extension":"png","order_by":22,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":36644,"visible":true,"origin":"","legend":"","description":"","filename":"Onlineimage3.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/5a052415ae7231c760db67cb.png"},{"id":94465796,"identity":"bd113c8d-8dae-433b-ac29-35730795e5de","added_by":"auto","created_at":"2025-10-27 15:18:49","extension":"png","order_by":23,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":37221,"visible":true,"origin":"","legend":"","description":"","filename":"Onlineimage4.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/1d07d2bc5935254a72b308a3.png"},{"id":94465936,"identity":"bc2fe441-66d1-4615-af69-48adc517dfff","added_by":"auto","created_at":"2025-10-27 15:19:17","extension":"png","order_by":24,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":42273,"visible":true,"origin":"","legend":"","description":"","filename":"Onlineimage5.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/66e55d29d1e6a58774d4e492.png"},{"id":94465666,"identity":"4343e393-7c31-4023-98cd-b780fd375005","added_by":"auto","created_at":"2025-10-27 15:18:04","extension":"png","order_by":25,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":36903,"visible":true,"origin":"","legend":"","description":"","filename":"Onlineimage6.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/9e7aa3567fad6b1585344e91.png"},{"id":94465810,"identity":"5976964c-c6d9-4b94-988e-017597e028c5","added_by":"auto","created_at":"2025-10-27 15:18:56","extension":"png","order_by":26,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":36975,"visible":true,"origin":"","legend":"","description":"","filename":"Onlineimage7.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/f3171cb50ebd16e9868257a1.png"},{"id":94465746,"identity":"ad12d420-cedf-4991-8e97-94a95b5e471e","added_by":"auto","created_at":"2025-10-27 15:18:46","extension":"png","order_by":27,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":39017,"visible":true,"origin":"","legend":"","description":"","filename":"Onlinefloatimage2.png","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/ea56697ba06b29399ae37902.png"},{"id":94465938,"identity":"716d094b-626b-4096-805e-5562ca44987b","added_by":"auto","created_at":"2025-10-27 15:19:17","extension":"xml","order_by":28,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":130739,"visible":true,"origin":"","legend":"","description":"","filename":"9db85df1ed834e868eb0a4e533da7f6e1structuring.xml","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/8904d125d98a0556a6c4ace4.xml"},{"id":94465678,"identity":"3c9e5f4d-a8f7-4994-aed6-df755a57324f","added_by":"auto","created_at":"2025-10-27 15:18:14","extension":"html","order_by":29,"title":"","display":"","copyAsset":false,"role":"acdc-reference","size":142159,"visible":true,"origin":"","legend":"","description":"","filename":"earlyproof.html","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1/a3a184a2a319dfc894ea0f13.html"},{"id":94474323,"identity":"17a07657-9cc1-4e14-816d-a37e74559ed0","added_by":"auto","created_at":"2025-10-27 15:48:23","extension":"pdf","order_by":1,"title":"","display":"","copyAsset":false,"role":"manuscript-pdf","size":2006708,"visible":true,"origin":"","legend":"","description":"","filename":"ManuscriptMLforSputteringJKPS.pdf","url":"https://assets-eu.researchsquare.com/files/rs-7787957/v1_covered_03368e45-fc95-4803-af50-fc6aa3d6d53b.pdf"}],"financialInterests":"No competing interests reported.","formattedTitle":"Predicting Magnetron Sputtering Deposition Rate through Process Parameters Using Supervised Machine Learning","fulltext":[],"fulltextSource":"","fullText":"","funders":[],"hasAdminPriorityOnWorkflow":false,"hasManuscriptDocX":false,"hasOptedInToPreprint":true,"hasPassedJournalQc":"","hasAnyPriority":false,"hideJournal":false,"highlight":"","institution":"","isAcceptedByJournal":true,"isAuthorSuppliedPdf":true,"isDeskRejected":"","isHiddenFromSearch":false,"isInQc":false,"isInWorkflow":false,"isPdf":true,"isPdfUpToDate":true,"isWithdrawnOrRetracted":false,"journal":{"display":true,"email":"[email protected]","identity":"journal-of-the-korean-physical-society","isNatureJournal":false,"hasQc":true,"allowDirectSubmit":false,"externalIdentity":"","sideBox":"Learn more about [Journal of the Korean Physical Society](https://link.springer.com/journal/40042)","snPcode":"40042","submissionUrl":"https://submission.springernature.com/new-submission/40042/3","title":"Journal of the Korean Physical Society","twitterHandle":"","acdcEnabled":true,"dfaEnabled":true,"editorialSystem":"stoa","reportingPortfolio":"Springer Hybrid","inReviewEnabled":true,"inReviewRevisionsEnabled":false},"keywords":"Substrate-target distance, hyperparameters, Sputtering pressure, Coefficient of determination, Regression models","lastPublishedDoi":"10.21203/rs.3.rs-7787957/v1","lastPublishedDoiUrl":"https://doi.org/10.21203/rs.3.rs-7787957/v1","license":{"name":"CC BY 4.0","url":"https://creativecommons.org/licenses/by/4.0/"},"manuscriptAbstract":"\u003cp\u003eMagnetron sputtering, a widely used physical vapor deposition method, is a plasma-matter interaction process. The magnetron sputtering application includes semiconductor fabrication, optics, and surface coating. The key roles of sputtering in the semiconductor industry are forming interconnects, barrier layers, electrode contacts in solar cells, integrated circuits, and other microelectronic devices. Despite wide applications and impact, rare mathematical analyses exist for predicting the deposition rate derived from first principles. A supervised machine learning approach uses process parameters such as power, target-substrate distance, and target material to determine the deposition rate. The work explains the process parameters and their impact on the deposition rate. Seven regression machine learning models are briefly discussed, with the relevance for model sputtering deposition rate, which are evaluated using parameters such as Mean Squared Error, Mean Absolute Error, and Coefficient of determination (\u003cem\u003eR\u003c/em\u003e\u003csup\u003e\u003cem\u003e2\u003c/em\u003e\u003c/sup\u003e). The average performing models are tree-based regression models with \u003cem\u003eR\u003c/em\u003e\u003csup\u003e\u003cem\u003e2\u003c/em\u003e\u003c/sup\u003e above 0.9 and minimal error. Random Forest and XGBoost are the top-performing models, with \u003cem\u003eR\u0026sup2;\u003c/em\u003e of 0.96 and 0.97, respectively. Predicting the sputter deposition rate using optimized machine learning is a novel approach to reduce experimental time and expenditure.\u003c/p\u003e","manuscriptTitle":"Predicting Magnetron Sputtering Deposition Rate through Process Parameters Using Supervised Machine Learning","msid":"","msnumber":"","nonDraftVersions":[{"code":1,"date":"2025-10-27 13:19:23","doi":"10.21203/rs.3.rs-7787957/v1","editorialEvents":[{"type":"communityComments","content":0},{"type":"editorInvitedReview","content":"","date":"2026-02-03T11:43:13+00:00","index":"hide","fulltext":""},{"type":"reviewerAgreed","content":"12131720810982936558112250006640108951","date":"2025-12-15T08:17:58+00:00","index":"hide","fulltext":""},{"type":"reviewersInvited","content":"","date":"2025-10-13T03:32:40+00:00","index":"","fulltext":""},{"type":"editorAssigned","content":"","date":"2025-10-13T01:25:37+00:00","index":"","fulltext":""},{"type":"checksComplete","content":"","date":"2025-10-10T01:04:08+00:00","index":"","fulltext":""},{"type":"submitted","content":"Journal of the Korean Physical Society","date":"2025-10-06T04:43:07+00:00","index":"","fulltext":""}],"status":"published","journal":{"display":true,"email":"[email protected]","identity":"journal-of-the-korean-physical-society","isNatureJournal":false,"hasQc":true,"allowDirectSubmit":false,"externalIdentity":"","sideBox":"Learn more about [Journal of the Korean Physical Society](https://link.springer.com/journal/40042)","snPcode":"40042","submissionUrl":"https://submission.springernature.com/new-submission/40042/3","title":"Journal of the Korean Physical Society","twitterHandle":"","acdcEnabled":true,"dfaEnabled":true,"editorialSystem":"stoa","reportingPortfolio":"Springer Hybrid","inReviewEnabled":true,"inReviewRevisionsEnabled":false}}],"origin":"","ownerIdentity":"fa1c4f3c-9d82-4b36-889d-6612be2c27b8","owner":[],"postedDate":"October 27th, 2025","published":true,"recentEditorialEvents":[],"rejectedJournal":[],"revision":"","amendment":"","status":"under-review","subjectAreas":[],"tags":[],"updatedAt":"2026-02-10T00:08:37+00:00","versionOfRecord":[],"versionCreatedAt":"2025-10-27 13:19:23","video":"","vorDoi":"","vorDoiUrl":"","workflowStages":[]},"version":"v1","identity":"rs-7787957","journalConfig":"researchsquare"},"__N_SSP":true},"page":"/article/[identity]/[[...version]]","query":{"redirect":"/article/rs-7787957","identity":"rs-7787957","version":["v1"]},"buildId":"8U1c8b4HqxoKbykW_rLl7","isFallback":false,"isExperimentalCompile":false,"dynamicIds":[84888],"gssp":true,"scriptLoader":[]}