Study of the Features of Coating Deposition on a Carbide Substrate Using Preliminary Etching with Glow Discharge Plasma

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Glow discharge etching improved Ti-TiN-(Ti,Cr,Al)N coating scratch resistance and wear, especially at higher cutting speeds, by preventing nanolayer formation at the coating-substrate interface.

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Abstract

The properties of coatings obtained using two surface preparation methods were compared: heating and etching by ion bombardment with plasma generation by arc evaporators and heating and etching by a glow discharge. A Ti-TiN-(Ti,Cr,Al)N coating was deposited. The use of a glow discharge provides better resistance of the coating to destruction during the scratch test and wear resistance of metal-cutting tools when turning steel. As the cutting speed increases, the advantage in wear resistance of the coating deposited using a glow discharge increases. During the process of heating and etching by ion bombardment with metal ions, a nanolayer rich in cobalt and tooling elements (iron, molybdenum) is formed in the area of the interface of the coating and the carbide substrate. When heated and etched by a glow discharge, such a layer does not form. When using both methods, there is identical diffusion of tungsten into the coating and diffusion of chromium and possibly titanium into the substrate. Thus, the glow discharge heating and etching method can be effectively used in the process of PVD coating deposition.

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europepmc
last seen: 2026-05-20T01:45:00.602351+00:00