Characterization of Acid Activation of Bentonite Clay of Hada, Afar, Ethiopia
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Abstract
The applications of various clay minerals are related to their structural, physical and chemical characteristics. The physical and chemical properties of the clay minerals dictate their utilization in the industries and beneficiation required before usage. The study aimed at establishing the potentiality of acid activated clay mineral from Hadar, Afar, Ethiopia. XRD, SEM, EDXRF and FT-IR spectroscopies were employed to characterize the chemical compositions and interaction in the bentonite samples. The XRD results revealed that the native and activated bentonite clay contains similar minerals, such as; Montmorillonite [(Ca, Na) 0.33 (Al, Mg)2(Si4O10)(OH)2.nH2O], Quartz [SiO2], albite [NaAl2SiO6], zeolite [CaAl2O3.SiO2.nH2O], and aluminum silicate. Thus, attributes the bentonite clay was composed of SiO2 and Al2O3 indicating that it is an aluminosilicate mineral and the morphology of bentonite was supported by SEM. The chemical analysis by EDXRF revealed that the native bentonite consists of 58.18wt% (SiO2), 14.28 wt% (Al2O3) and Na2O > CaO are the major constituents of the clay with other oxides present in low amount. There was an increase in SiO2 content in activated bentonites, the Al2O3, Fe2O3, and MgO content have decreased by 48.56%, 66.36%, and 84.42%, respectively. The FTIR specta bands at 1627cm–1, and 1027cm−1 were attributed to Al-Mg-OH, Al-Al-OH, and Al-OH-O-Si stretching vibration and the reduction of the content of the octahedral cations is accompanied by a decrease of both OH bending vibrations at 1627 and 3401 cm−1. The FT-IR result is in clear agreement with the SEM, XRD and EDXRF studies which indicate sequential degradation of the clay sheet upon acid treatment. hence rendering the activated bentonite clay have accounted for their demand for different industrial applications such as; its use as detoxifier, sealant, binder, fillers for paper, pharmaceutical products, absorbent, adsorbent, catalyst, nanoclays, et.
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- last seen: 2026-05-19T01:45:01.086888+00:00
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License: CC-BY-4.0