Exploring the nano-polishing mechanisms of Invar

Exploring the nano-polishing mechanisms of Invar | Research Square window.SnipcartSettings = { analytics: { enabled: false } }; (function() { var accessVector = localStorage.getItem('access_vector') || ''; window.dataLayer = window.dataLayer || []; if (accessVector) { window.dataLayer.push({ user: { profile: { profileInfo: { snid: accessVector } } } }); } })(); (function(w,d,s,l,i){w[l]=w[l]||[];w[l].push({'gtm.start':new Date().getTime(),event:'gtm.js'});var f=d.getElementsByTagName(s)[0],j=d.createElement(s),dl=l!='dataLayer'?'&l='+l:'';j.async=true;j.src='https://www.googletagmanager.com/gtm.js?id='+i+dl;f.parentNode.insertBefore(j,f);})(window,document,'script','dataLayer','GTM-K279D39R'); Browse Preprints In Review Journals COVID-19 Preprints AJE Video Bytes Research Tools Research Promotion AJE Professional Editing AJE Rubriq About Preprint Platform In Review Editorial Policies Our Team Advisory Board Help Center Sign In Submit a Preprint Cite Share Download PDF Research Article Exploring the nano-polishing mechanisms of Invar Wan Wang, Dongpeng Hua, Dawei Luo, Qing Zhou, Stefan J. Eder, and 3 more This is a preprint; it has not been peer reviewed by a journal. https://doi.org/ 10.21203/rs.3.rs-1694365/v1 This work is licensed under a CC BY 4.0 License Status: Posted Version 1 posted You are reading this latest preprint version Abstract With the rapid development of nano-polishing technology, ultra-precise micro-nano components require tighter tolerances for the surface engineering of the Invar alloy. Due to its low hardness and high chemical activity, it is a challenge to reveal the nano-polishing mechanism experimentally. In this work, we studied the effect of polishing parameters on the nano-polishing properties of Invar by molecular dynamics simulation, and experiments were conducted to verify the simulation results. Our findings indicate that higher polishing speed and shallower polishing depth with optimized rolling torque can lead to a reduction of the subsurface damage layer thickness as well as an improvement in polishing efficiency and surface quality. The nano-polishing mechanism is revealed, showing that effective removal occurs only in the plowing regime and the cutting regime, which require sufficient rolling and sliding depths, respectively. Furthermore, an analytic removal theory was developed that excellently describes and predicts the polishing behavior of Invar. This work provides a guideline for improving the polishing precision, surface quality, and material removal efficiency for Invar work pieces. Materials Engineering Nano-polishing Subsurface damage layer Invar alloy Molecular dynamics simulation Full Text Declarations Competing interests: The authors declare no competing interests. Cite Share Download PDF Status: Posted Version 1 posted You are reading this latest preprint version Research Square lets you share your work early, gain feedback from the community, and start making changes to your manuscript prior to peer review in a journal. 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Also discoverable on Platform About Our Team In Review Editorial Policies Advisory Board Help Center Resources Author Services Accessibility API Access RSS feed Manage Cookie Preferences © Research Square 2026 | ISSN 2693-5015 (online) Privacy Policy Terms of Service Do Not Sell My Personal Information {"props":{"pageProps":{"initialData":{"identity":"rs-1694365","acceptedTermsAndConditions":true,"allowDirectSubmit":true,"archivedVersions":[],"articleType":"Research Article","associatedPublications":[],"authors":[{"id":108847029,"identity":"ccacad80-6db5-4f04-82ab-82d9f379d406","order_by":0,"name":"Wan Wang","email":"","orcid":"","institution":"Northwestern Polytechnical University","correspondingAuthor":false,"submittingAuthor":false,"prefix":"","firstName":"Wan","middleName":"","lastName":"Wang","suffix":""},{"id":108847030,"identity":"d7f6481e-e871-4a81-83ee-1fd725e5d316","order_by":1,"name":"Dongpeng Hua","email":"","orcid":"","institution":"Northwestern Polytechnical University","correspondingAuthor":false,"submittingAuthor":false,"prefix":"","firstName":"Dongpeng","middleName":"","lastName":"Hua","suffix":""},{"id":108847031,"identity":"2f2f011d-a2ab-4630-b79f-a3f207bb472e","order_by":2,"name":"Dawei Luo","email":"","orcid":"","institution":"Northwestern Polytechnical University","correspondingAuthor":false,"submittingAuthor":false,"prefix":"","firstName":"Dawei","middleName":"","lastName":"Luo","suffix":""},{"id":108847032,"identity":"13ab9e75-cbb0-45ab-9e8f-f68018921445","order_by":3,"name":"Qing Zhou","email":"data:image/png;base64,iVBORw0KGgoAAAANSUhEUgAAAZAAAAAyAQMAAABI0h/eAAAABlBMVEX///8AAABVwtN+AAAACXBIWXMAAA7EAAAOxAGVKw4bAAAA3ElEQVRIiWNgGAWjYDACCRBhwMDAD+UzNhCtRbKBNC0gXQeI1SI/u/mYxJuCO3abb/eYPeZhsJHdcID52QN8WhjnHEuTnGPwLHnbnTPmxjwMacYbDrCZG+DTwiyRYybNY3A42exG7jZpHobDiRsO8LBJ4NPCBtNiPAOs5T9hLTxQLXYGEmAtBwhrkZBIS7acY3A4QeJG/nfDOQbJxjMPs5nh1SI/I/ngjTd/Dtvzz0hLe/Cmwk6273jzM7xaIK5jYEhsAPoLHKcMzATVQ7TYM4C1jIJRMApGwSjAAgCHWEQkEgumQQAAAABJRU5ErkJggg==","orcid":"","institution":"Northwestern Polytechnical University","correspondingAuthor":true,"submittingAuthor":false,"prefix":"","firstName":"Qing","middleName":"","lastName":"Zhou","suffix":""},{"id":108847033,"identity":"29daddb0-902b-48ea-94c9-5c43f9963172","order_by":4,"name":"Stefan J. 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Due to its low hardness and high chemical activity, it is a challenge to reveal the nano-polishing mechanism experimentally. In this work, we studied the effect of polishing parameters on the nano-polishing properties of Invar by molecular dynamics simulation, and experiments were conducted to verify the simulation results. Our findings indicate that higher polishing speed and shallower polishing depth with optimized rolling torque can lead to a reduction of the subsurface damage layer thickness as well as an improvement in polishing efficiency and surface quality. The nano-polishing mechanism is revealed, showing that effective removal occurs only in the plowing regime and the cutting regime, which require sufficient rolling and sliding depths, respectively. Furthermore, an analytic removal theory was developed that excellently describes and predicts the polishing behavior of Invar. 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