Uranium Electrodeposition at Boron-Doped Diamond Electrodes

Abstract The uranium electrodeposition process on a boron-doped diamond electrode (BDD) surface at varying potentials as a means of environmental uranium remediation has been studied. The chronoamperometry technique was employed for the electrodeposition process, applying potentials ranging from − 0.60V to -2.00V vs. the reversible hydrogen electrode (RHE). A 2mM uranyl acetate dihydrate (UO2(C2H3O2)2·2H2O) solution in 0.1M KClO4 served as a model uranyl ion (UO22+) source. Analysis using scanning electron microscopy, energy-dispersive X-ray fluorescence spectroscopy, and atomic force microscopy (AFM) confirmed the presence of uranium and the formation of a thin layer on the electrode surface. Roughness measurements obtained through AFM analysis at different applied potentials vs. RHE were compared before and after uranium electrodeposition at BDD electrodes. Additionally, the identification of various uranium oxides resulting from the electrodeposition procedures was conducted using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. These analyses revealed the presence of UO2, UO3, and U3O8 on the BDD electrode surface due to the electrochemical deposition process, with a notable proportion of U3O8 observed. Ultimately, the optimal potential for efficient U6+ remediation from aqueous media and the formation of a uniform thin layer conducive to nuclear technology development was determined to be -1.75V vs. RHE.