Generalized Photo-Thermo-Microstretch Elastic Solid Semiconductor Medium Due To Excitation Process

Abstract A novel model in the theory of photo-thermoelasticity with microstretch properties is studied. The plasma-elastic-thermal plane waves are propagated in a linear isotropic generalized photo-thermo-microstretch elastic semiconductor solid medium. The photothermal excitation occurs in the context of the microinertia of microelement process during two dimensions (2D) deformation. The harmonic wave techniques are used to get the solutions for the basic variables. The analytical solution of the main physical fields; carrier intensity, normal displacement components, temperature, stress load force, microstress and tangential coupled stress can be obtained. Some graphics illustrated when using the plasma, thermal and mechanical load boundary conditions, which they apply at the outer free surface of the elastic medium. Some semiconductor materials as silicon (Si) and Germanium (Ge) are used to make the numerical simulation and some comparisons in different thermal memories are made. The main physical variables with new parameters are discussed theoretically and shown graphically.