Investigations on Process Parameters of Cluster Magnetorheological Polishing in a planet motion model | Research Square window.SnipcartSettings = { analytics: { enabled: false } }; (function() { var accessVector = localStorage.getItem('access_vector') || ''; window.dataLayer = window.dataLayer || []; if (accessVector) { window.dataLayer.push({ user: { profile: { profileInfo: { snid: accessVector } } } }); } })(); (function(w,d,s,l,i){w[l]=w[l]||[];w[l].push({'gtm.start':new Date().getTime(),event:'gtm.js'});var f=d.getElementsByTagName(s)[0],j=d.createElement(s),dl=l!='dataLayer'?'&l='+l:'';j.async=true;j.src='https://www.googletagmanager.com/gtm.js?id='+i+dl;f.parentNode.insertBefore(j,f);})(window,document,'script','dataLayer','GTM-K279D39R'); Browse Preprints In Review Journals COVID-19 Preprints AJE Video Bytes Research Tools Research Promotion AJE Professional Editing AJE Rubriq About Preprint Platform In Review Editorial Policies Our Team Advisory Board Help Center Sign In Submit a Preprint Cite Share Download PDF Research Article Investigations on Process Parameters of Cluster Magnetorheological Polishing in a planet motion model song chen, Tianwu Cai This is a preprint; it has not been peer reviewed by a journal. https://doi.org/ 10.21203/rs.3.rs-2597282/v1 This work is licensed under a CC BY 4.0 License Status: Published Journal Publication published 08 Sep, 2023 Read the published version in The International Journal of Advanced Manufacturing Technology → Version 1 posted 3 You are reading this latest preprint version Abstract A planetary-type cluster magnetorheological polishing device with a rotating magnetic field was proposed to solve the problems of abrasive accumulation and low polishing efficiency caused by the untimely restoration of the conventional magnetic chain. Considering the microstructural deformation and squeeze-strengthening effect of magnetorheological polishing fluid, a material removal rate model was established based on the principle of fluid dynamic pressure and verified by experiments. The relationships between material removal rate or roughness and processing parameters were confirmed by multiple linear regression analyses, respectively. And the processing parameters optimization was made by linear weighting method under the premise of establishing the evaluation system. The results show that the eccentricity and angular velocity ratio are proportional and inversely proportional to MRR, respectively. When the polishing fluid is squeezed, the material removal rate can be significantly increased from 7nm/min to 21nm/min, but the roughness will be reversed at a gap of less than 0.9mm. After the optimization of processing parameters, the workpiece roughness after rough and fine polishing was reduced from 1.079µm and 1.083µm to 0.346µm and 0.184µm, with a reduction of 67.9% and 83.01%. Cluster Magnetorheological Polishing microstructural deformation Material removal rate Roughness Processing parameters optimization Full Text Cite Share Download PDF Status: Published Journal Publication published 08 Sep, 2023 Read the published version in The International Journal of Advanced Manufacturing Technology → Version 1 posted Reviewers agreed at journal 27 Feb, 2023 Editor assigned by journal 22 Feb, 2023 First submitted to journal 21 Feb, 2023 You are reading this latest preprint version Research Square lets you share your work early, gain feedback from the community, and start making changes to your manuscript prior to peer review in a journal. As a division of Research Square Company, we’re committed to making research communication faster, fairer, and more useful. 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Also discoverable on Platform About Our Team In Review Editorial Policies Advisory Board Help Center Resources Author Services Accessibility API Access RSS feed Manage Cookie Preferences © Research Square 2026 | ISSN 2693-5015 (online) Privacy Policy Terms of Service Do Not Sell My Personal Information {"props":{"pageProps":{"initialData":{"identity":"rs-2597282","acceptedTermsAndConditions":true,"allowDirectSubmit":false,"archivedVersions":[],"articleType":"Research Article","associatedPublications":[],"authors":[{"id":179467489,"identity":"51de5a65-40fd-4021-b40f-c93222705964","order_by":0,"name":"song chen","email":"data:image/png;base64,iVBORw0KGgoAAAANSUhEUgAAAZAAAAAyAQMAAABI0h/eAAAABlBMVEX///8AAABVwtN+AAAACXBIWXMAAA7EAAAOxAGVKw4bAAAA40lEQVRIiWNgGAWjYLACxgYGBjZm9sMPPhjY2BGvhY+dJ81wRkFaMvFa5PgZDKR5PhwCsfED+fbewy9+7rDJY2NmSDC2MTjAzMB++OgGfFoMzpxLs+w9k1bMxsx44HGOwR0+Bp60tBt4tUjkmBkzth1ObAPZkmPwjJlBgscMrxb5GWAt/0FaDKQtDA4zNhDSwnAjx/gxY9sBiBYGYrQYnDljxtjblgzUAgzkHoO0ZDZCfpFv7zH+8LPNLnF+//HDD378sbHjZz98DL/DgPEugcoloBwEmD8QoWgUjIJRMApGMgAATydIUlZ3yvkAAAAASUVORK5CYII=","orcid":"https://orcid.org/0000-0002-4000-9208","institution":"Chongqing University of Technology","correspondingAuthor":true,"submittingAuthor":false,"prefix":"","firstName":"song","middleName":"","lastName":"chen","suffix":""},{"id":179467490,"identity":"8311df0b-7545-4376-a570-34bb9d0e288d","order_by":1,"name":"Tianwu Cai","email":"","orcid":"","institution":"","correspondingAuthor":false,"submittingAuthor":false,"prefix":"","firstName":"Tianwu","middleName":"","lastName":"Cai","suffix":""}],"badges":[],"createdAt":"2023-02-17 05:24:59","currentVersionCode":1,"declarations":"","doi":"10.21203/rs.3.rs-2597282/v1","doiUrl":"https://doi.org/10.21203/rs.3.rs-2597282/v1","draftVersion":[],"editorialEvents":[{"content":"https://doi.org/10.1007/s00170-023-12258-4","type":"published","date":"2023-09-08T15:01:35+00:00"}],"editorialNote":"","failedWorkflow":false,"files":[{"id":42947161,"identity":"2c5059de-240c-4a50-829d-525ae541f0c4","added_by":"auto","created_at":"2023-09-11 15:06:42","extension":"pdf","order_by":1,"title":"","display":"","copyAsset":false,"role":"manuscript-pdf","size":1931332,"visible":true,"origin":"","legend":"","description":"","filename":"ProcessParametersofClusterMagnetorheologicalPolishing.pdf","url":"https://assets-eu.researchsquare.com/files/rs-2597282/v1_covered_85e6db9a-346e-4f1d-a345-e5909d8b56db.pdf"}],"financialInterests":"","formattedTitle":"Investigations on Process Parameters of Cluster Magnetorheological Polishing in a planet motion model","fulltext":[],"fulltextSource":"","fullText":"","funders":[],"hasAdminPriorityOnWorkflow":false,"hasManuscriptDocX":false,"hasOptedInToPreprint":true,"hasPassedJournalQc":"","hasAnyPriority":false,"hideJournal":false,"highlight":"","institution":"","isAcceptedByJournal":true,"isAuthorSuppliedPdf":true,"isDeskRejected":"","isHiddenFromSearch":false,"isInQc":false,"isInWorkflow":false,"isPdf":true,"isPdfUpToDate":true,"isWithdrawnOrRetracted":false,"journal":{"display":true,"email":"
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